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Study of self-heating influence on device performance of 0.1μm SOI MOSFETs including velocity overshoot

机译:对0.1μmSOIMOSFET的装置性能的自热影响,包括速度过冲

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摘要

Drain current degradation due to the self-heating effect in sub-0.1μm SOT MOSFETs is investigated, focussing on the comparison with bulk devices. It was found that the difference of the current degradation between SOT and bulk device could be reduced- with shortening the gate length into deep submicrometer region. This is because that the velocity overshoot effect dominates the drain current. In this situation, the carrier velocity is independent of lattice temperature.
机译:研究了漏极电流降解由于亚01μmSOTMOSFET中的自热效果,重点关注与散装装置的比较。 发现可以减少SOT和散装装置之间的电流劣化的差异,使栅极长度缩短到深潜置尺寸区域中。 这是因为速度过冲效果主导漏极电流。 在这种情况下,载流器与晶格温度无关。

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