Measurement of particles and inorganic gaseous contaminants in clean rooms

摘要

In the modern LSI fabs, control of particles in the clean room has been a MUST for production yield, while removal of gaseous contaminants such as ammonia and acid gas has become next critical issue.The Yokogawa PT1000 utilizing Helium microwave-induced plasma (He-MIP) measures components, composition and size of particles at the same time and thus identify the source of particle generation or contaminants in the clean room.The CM500 utilizes unique diffusion scrubber or impinger as for gas collection device and specially designed high sensitivity Ion-chromatograph for the analyzer.With those two key devices, The CM500 measures those gaseous contaminants in the clean room with the sensitivity of 0.01ppb.This paper introduces outline of PT1000 and CM500 its clean room application.