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Revealing the Role of TiO2 Surface Treatment of Hematite Nanorods Photoanodes for Solar Water Splitting

机译:揭示TiO2表面处理赤铁矿纳米棒光阳极在太阳能水分解中的作用

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Ultrathin TiO2 is deposited on conventional hydrothermal grown hematite nanorod arrays by atomic layer deposition (ALD). Significant photoelectrochemical water oxidation performance improvement is observed when the ALD TiO2-treated samples are annealed at 650 degrees C or higher temperatures. The electrochemical impedance spectroscopy (EIS) study shows a surface trap-mediated charge transfer process exists at the hematite electrolyte interface. Thus, one possible reason for the improvement could be the increased surface states at the hematite surface, which leads to better charge separation, less electron hole recombination, and hence, greater improvement of photocurrent. Our Raman study shows the increase in surface defects on the ALD TiO2-coated hematite sample after being annealed at 650 degrees C or higher temperatures. A photo current of 1.9 mA cm(-2) at 1.23 V (vs RHE) with a maximum of 2.5 mA cm(-2) at 1.8 V (vs RHE) in 1 M NaOH under AM 1.5 simulated solar illumination is achieved in optimized deposition and annealing conditions.
机译:通过原子层沉积(ALD)将超薄TiO2沉积在常规水热生长的赤铁矿纳米棒阵列上。当将经ALD TiO2处理的样品在650摄氏度或更高的温度下退火时,可以观察到光电化学水氧化性能的显着改善。电化学阻抗谱(EIS)研究表明,赤铁矿电解质界面处存在表面陷阱介导的电荷转移过程。因此,改善的一个可能原因可能是赤铁矿表面的表面状态增加,这导致更好的电荷分离,更少的电子空穴复合,从而更大地改善了光电流。我们的拉曼研究显示,在650摄氏度或更高的温度下退火后,涂有ALD TiO2的赤铁矿样品的表面缺陷增加。在AM 1.5模拟太阳光照下,在1.23 V(vs RHE)下的1.9 mA cm(-2)的光电流在1 M NaOH中在1.8 V(vs RHE)下的最大电流为2.5 mA cm(-2)沉积和退火条件。

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