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Study on the Photoresponse of Amorphous In-Ga-Zn-O and Zinc Oxynitride Semiconductor Devices by the Extraction of Sub-Gap-State Distribution and Device Simulation

机译:亚间隙态分布的提取和器件模拟研究非晶态In-Ga-Zn-O和氧氮化锌半导体器件的光响应

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Persistent photoConduction (PPC) is a phenomenon that limits the application of oxide semiconductor thin-film transistors (TFTs) in optical sensor-embedded displays. In the present work, a study on zinc oxynitride (ZnON) semiconductor TFTs based on the combination of experimental results and device simulation is presented, Devices incorporating ZnON semiconductors exhibit negligible PPC effects compared with amorphous In-Ga-Zn-O (a-IGZO) TFTs, and the difference between the two types of materials are examined by monochromatic photonic C-V spectroscopy (MPCVS). The latter method allows the estimation of the density of subgap states in the semiconductor, which may account for the different behavior of ZnON and IGZO materials with respect to illumination and the associated PPC. In the case of a-IGZO TFTs, the oxygen flow rate during the sputter deposition of a-IGZO is found to influence the amount of PPC. Small oxygen flow rates result in pronounced PPC, and large densities of valence band tail (VBT) states are observed in the corresponding devices. This implies a dependence of PPC on the amount of oxygen vacancies (V-O), On the other hand, ZnON has a smaller bandgap than a-IGZO and contains a smaller density of VBT states over the entire range of its bandgap energy. Here, the concept of activation energy window (AEW) is introduced to explain the occurrence of PPC effects by photoinduced electron doping, which is likely to be associated with the formation of peroxides in the semiconductor. The analytical methodology presented in this report accounts well for the reduction of PPC in ZnON TFTs, and provides a quantitative tool for the systematic development of phototransistors for optical sensor-embedded interactive displays.
机译:持久光电导(PPC)是一种现象,限制了氧化物半导体薄膜晶体管(TFT)在嵌入光学传感器的显示器中的应用。在目前的工作中,基于实验结果和器件仿真的结合,对氮氧化锌(ZnON)半导体TFT进行了研究。与非晶In-Ga-Zn-O(a-IGZO)相比,包含ZnON半导体的器件的PPC效应可忽略不计TFT),并通过单色光子CV光谱(MPCVS)检查两种材料之间的差异。后一种方法可以估算半导体中的子隙态密度,这可以解释ZnON和IGZO材料在照明和相关PPC方面的不同行为。在a-IGZO TFT的情况下,发现在a-IGZO的溅射沉积期间的氧气流速会影响PPC的量。小氧气流​​速导致明显的PPC,并且在相应的设备中观察到大的价带尾态(VBT)状态密度。这意味着PPC对氧空位(V-O)量的依赖性。另一方面,ZnON的带隙小于a-IGZO,并且在其带隙能量的整个范围内包含较小的VBT态密度。在这里,引入活化能窗口(AEW)的概念来解释由于光致电子掺杂而引起的PPC效应的发生,这很可能与半导体中过氧化物的形成有关。本报告中介绍的分析方法很好地说明了ZnON TFT中PPC的减少,并为系统开发用于光学传感器嵌入式交互式显示器的光电晶体管提供了定量工具。

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