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首页> 外文期刊>ACS applied materials & interfaces >Electromagnetic Interference (EMI) Transparent Shielding of Reduced Graphene Oxide (RGO) Interleaved Structure Fabricated by Electrophoretic Deposition
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Electromagnetic Interference (EMI) Transparent Shielding of Reduced Graphene Oxide (RGO) Interleaved Structure Fabricated by Electrophoretic Deposition

机译:电泳沉积制备的氧化石墨烯(RGO)交错结构的电磁干扰(EMI)透明屏蔽

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Here we introduce the electromagnetic shielding effectiveness (SE) of reduced graphene oxide (RGO) sheets interleaved between polyetherimide (PEI) films fabricated by electrophoretic deposition (EPD). Incorporating only 0.66 vol % of RGO, the developed PEI/RGO composite films exhibited an electromagnetic interference shielding effectiveness (EMI SE) at 6.37 dB corresponding to ~50% shielding of incident waves. Excellent flexibility and optical transparency up to 62% of visible light was demonstrated. It was achieved by placing the RGO sheets in the localized area as a thin film (ca. 20 nm in thickness) between the PEI films (ca. 2 μm) to be an interleaved and alternating structure. This unique interleaved structure without any delamination areas was fabricated by a successive application of cathodic and anodic EPD of both RGO and PEI layers. The EPD fabrication process was ensured by an alternating deposition of the quarternized-PEI drops and RGO, each taking positive and negative charges, respectively, in the water medium. We believe that the developed facile fabrication method of RGO interleaved structure with such low volume fraction has great potential to be used as a transparent EMI shielding material.
机译:在这里,我们介绍了在电泳沉积(EPD)制成的聚醚酰亚胺(PEI)膜之间插入的还原氧化石墨烯(RGO)板的电磁屏蔽效果(SE)。所开发的PEI / RGO复合膜仅包含RGO的0.66%(体积),在6.37 dB处表现出电磁干扰屏蔽效果(EMI SE),相当于对入射波的屏蔽率约为50%。展示了高达62%的可见光的出色柔韧性和光学透明性。通过将RGO薄板放置在局部区域中,作为PEI膜(约2μm)之间的薄膜(约20 nm厚度),可以实现交错和交替的结构。通过连续应用RGO和PEI层的阴极和阳极EPD,可以制造出没有任何分层区域的独特交错结构。通过在水介质中交替沉积分别带正电荷和负电荷的季铵化PEI液滴和RGO,可以确保EPD的制造过程。我们相信,如此低体积分数的RGO交错结构的简易制造方法具有很大的潜力,可以用作透明的EMI屏蔽材料。

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