A high performance low aberration projection electron gun design

摘要

This paper discusses a newly developed Low Aberration Projection (LAP) gun with a redesigned Beam Forming Region (BFR) to match the large diameter High-UPF gun Main Lens (ML). Under the reoptimization condition the 4mA spot size was further reduced from 0.25mm to 0.18mm. Computer modeling procedure and it results are given and some experimental result is discussed.