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Optimizing the third harmonic generated from air plasma filaments pumped by femtosecond laser pulses

机译:优化由飞秒激光脉冲泵送的空气等离子体长丝产生的第三次谐波

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摘要

Third-harmonic (TH) generation inside air plasma filaments provides a simple method to convert near-infrared laser pulses in the UV range. Here, we report on the optimization of the third-harmonic generation during filamentation in the parameter space of focusing geometry, gas pressure, and incident laser pulse energy. It is observed that, in the nonlinear filamentation regime, the TH yield is largely dominated by the geometrical focusing condition and gas pressure. Using ambient air as the medium for filamentation, an optimal numerical aperture (NA) = 0.07 was found for a laser pulse with a peak power close to and above the critical power for self-focusing. For more loose focusing geometry (NA < 0.047), reduction of the air pressure can improve the conversion efficiency. In this case, the spatial mode of the third harmonic was also found to be more uniform than in ambient air. With the scanning pinhole and crossing-filaments methods, it is revealed that in the situation of optimized focusing geometry (NA = 0.07) the TH accumulates constructively along the filament and exits at its end. In contrast, for the loose focusing geometry, the destructive interference effect of the TH generated at the leading and trailing edges of the filaments decreases the TH yield efficiency. This study provides a practical guidance for efficient conversion of near-infrared femtosecond pulses to the UV domain. (C) 2019 Optical Society of America
机译:空气等离子体内的第三次谐波(Th)产生提供了一种简单的方法,可以在UV范围内转换近红外激光脉冲。这里,我们报告在聚焦几何,气体压力和入射激光脉冲能中的参数空间中的细丝期间的第三谐波产生的优化。观察到,在非线性蠕虫状态下,产率在很大程度上由几何聚焦条件和气体压力构成。使用环境空气作为细丝的介质,发现了最佳数值孔径(NA)= 0.07,用于激光脉冲,其具有靠近的峰值功率和高于自聚焦的临界功率。对于更宽的聚焦几何形状(NA <0.047),减少气压可以提高转换效率。在这种情况下,还发现第三次谐波的空间模式比环境空气更均匀。利用扫描针孔和交叉丝的方法,据透露,在优化的聚焦几何形状(NA = 0.07)的情况下,TH沿着长丝的建设性地积聚并在其端部出口。相反,对于松散的聚焦几何形状,在长丝的前缘和后缘产生的Th的破坏性干扰效应降低了产量效率。本研究提供了近红外飞秒脉冲对UV结构域的有效转换的实用指导。 (c)2019年光学学会

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    Univ Shanghai Sci &

    Technol Shanghai Key Lab Modern Opt Syst 516 Jungong Rd Shanghai 200093 Peoples R China;

    Univ Shanghai Sci &

    Technol Shanghai Key Lab Modern Opt Syst 516 Jungong Rd Shanghai 200093 Peoples R China;

    Ecole Polytech CNRS ENSTA ParisTech Lab Opt Appl 828 Blvd Maiechaux F-91762 Palaiseau France;

    Ecole Polytech CNRS ENSTA ParisTech Lab Opt Appl 828 Blvd Maiechaux F-91762 Palaiseau France;

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  • 正文语种 eng
  • 中图分类 光学;
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