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首页> 外文期刊>Journal of the Korean Physical Society >Investigation of X-ray-induced Defects on Metals and Silicon by Using Coincidence Doppler Broadening Positron Annihilation Spectroscopy
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Investigation of X-ray-induced Defects on Metals and Silicon by Using Coincidence Doppler Broadening Positron Annihilation Spectroscopy

机译:用巧合多普勒拓宽正数湮灭光谱法研究金属和硅缺陷的研究

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摘要

The mechanical properties of Al, Ti, Fe, and Cu metals p-type Si, and n-type Si were investigated by using coincidence Doppler broadening (CDB) positron annihilation spectroscopy. The samples in this experiment were irradiated by using X-rays at generating powers for up to 9 kW. The data taken after the irradiation showed all the characteristic features predicted from defects with vacancies. The S parameter values of the metals were generally less than those of semiconductors such as p-type Si and n-type Si. The relationship between n-type Si and p-type Si were more affected when n-type Si rather than p-type Si was irradiated with X-rays.
机译:通过使用重合多普勒展展(CDB)正电子湮没光谱研究Al,Ti,Fe和Cu金属P型Si和N型Si的机械性能。 通过在产生高达9kW的功率时使用X射线照射该实验中的样品。 照射后所采取的数据显示了从空缺缺陷预测的所有特征特征。 金属的S参数值通常小于诸如P型Si和N型Si的半导体。 当用X射线照射n型Si而不是p型Si时,n型Si和p型Si之间的关系更受影响。

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