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首页> 外文期刊>Journal of Oral and Maxillofacial Surgery >Reconstruction of Full-Thickness Lower Lid Defects Using Texier's Procedure: Retrospective Assessment of the Indications
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Reconstruction of Full-Thickness Lower Lid Defects Using Texier's Procedure: Retrospective Assessment of the Indications

机译:使用Texier的过程重建全厚盖缺陷:对适应症的回顾性评估

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摘要

Purpose: Lower lid defects involving more than 75% of the lid's length or affecting the cheek are usually reconstructed with a Mustarde rotational cheek flap. This solution often induces postoperative ectropion. The Texier procedure (an upper lid myocutaneous flap and a chondromucosal alar graft) is usually indicated for 1-step reconstruction of full-thickness defects involving less than 50% of the lower lid. This retrospective study evaluated larger indications for the Texier procedure for full-thickness defects of the lower lid, results of lid defects longer than 50 or even 75%, and the use of a chondromucosal nasal septal graft for lid defects longer than 75%.
机译:目的:涉及超过75%的盖子长度或影响脸颊的盖子缺陷通常用芥末旋转脸颊皮瓣重建。 该解决方案通常诱导术后焦点。 Texier程序(盖子上盖肌皮瓣和软骨琥珀色移植物)通常表示为涉及低于下盖的50%的全厚度缺陷的1步重建。 该回顾性研究评估了用于下盖的全厚度缺陷的Texier程序的更大指示,盖子缺陷的结果超过50甚至75%,以及使用软骨瘤鼻腔器移植物的盖子缺陷超过75%。

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