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Effects of Thermal Annealing on Ti/Au Contacts to Anatase TiO2 Nanocrystal Films Prepared by Sol-Gel Method

机译:热退火对溶胶 - 凝胶法制备的锐钛矿TiO2纳米晶体膜的热退火

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摘要

The electrical properties of Ti/Au contacts to anatase TiO2 nanocrystal films are investigated under different thermal annealing temperature (300-500 degrees C) in a N-2 ambient. The as-deposited contact shows a non-linear current-voltage (I-V) property. However, after being annealed at 300 degrees C and 400 degrees C, the samples exhibit nearly ohmic I-V behaviors with currents at 5 V bias higher than that of as-deposited one by about three and seven times, respectively. When the annealing temperature is increased to 500 degrees C, the ohmic contact transform to Schottky contact. The influence of annealing temperatures on Ti/Au contacts to anatase TiO2 nanocrystal films depends on the interdiffusion behavior between the electrode layers and TiO2 films, which was investigated by Auger electron spectroscopy. Possible mechanisms are proposed to explain the influence of annealing temperature on the electrical properties of Ti/Au contacts to anatase TiO2 nanocrystal films.
机译:在N-2环境中在不同的热退火温度(300-500℃)下研究Ti / Au触点对锐钛矿TiO2纳米晶体的电性能。 沉积的接触显示非线性电流 - 电压(I-V)特性。 然而,在300度C和400摄氏度下退火后,样品分别表现出几乎欧姆I-V行为,其电流分别高于沉积约三倍和七次的电流。 当退火温度增加到500℃时,欧姆接触变换到肖特基接触。 退火温度对锐钛矿TiO2纳米晶体膜对Ti / Au触点的影响取决于电极层和TiO 2膜之间的间隔行为,由螺旋钻电子光谱研究。 提出可能的机制来解释退火温度对锐钛矿TiO2纳米晶体膜的Ti / Au触点的电性能的影响。

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  • 作者单位

    Nanjing Univ Posts &

    Telecommun Jiangsu Natl Synerget Innovat Ctr Adv Mat SICAM Key Lab Organ Elect &

    Informat Displays KLOEID Nanjing 210023 Jiangsu Peoples R China;

    ASTAR Inst Mat Res &

    Engn Singapore 117602 Singapore;

    Nanjing Univ Posts &

    Telecommun Jiangsu Natl Synerget Innovat Ctr Adv Mat SICAM Key Lab Organ Elect &

    Informat Displays KLOEID Nanjing 210023 Jiangsu Peoples R China;

    Beijing Normal Univ Business Sch Beijing 100875 Peoples R China;

    Nanjing Univ Posts &

    Telecommun Jiangsu Natl Synerget Innovat Ctr Adv Mat SICAM Key Lab Organ Elect &

    Informat Displays KLOEID Nanjing 210023 Jiangsu Peoples R China;

    Dalian Univ Technol Sch Phys &

    Optoelect Technol Dalian 116024 Peoples R China;

    Xiamen Univ Dept Phys Xiamen 361005 Fujian Peoples R China;

    Xiamen Univ Dept Phys Xiamen 361005 Fujian Peoples R China;

    Xiamen Univ Dept Phys Xiamen 361005 Fujian Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

    TiO2 Nanocrystal Film; Schottky Contact and Ohmic Contact; Thermal Annealing; Sol-Gel Method;

    机译:TiO2纳米晶体薄膜;肖特基接触和欧姆接触;热退火;溶胶 - 凝胶法;

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