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Study on the Effect of the Thiourea on Nano-Mechanical Properties and Microstructures of the Electroformed Thin Ni-P Foil

机译:Thiourea对电铸薄Ni-P箔纳米力学性能和微观结构的影响研究

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The effect of thiourea on the nano-mechanical and chemical properties of Ni-P foil was studied to develop a high performance Ni-P deposit for automobile and machinery parts. The Ni-P deposit was prepared by electroforming in a modified sulphate bath with different amounts of thiourea. Chemical analysis of the electrodeposited Ni-P foils by energy dispersive spectroscopy showed that phosphorous in the foil was reduced with thiourea. Structural analysis by X-ray diffractometry revealed that the (111) plane of the Ni-P deposits grew preferentially with increasing crystallinity. Surface analysis by atomic force microscopy and field-emission scanning electron microscopy showed that the surfaces of the Ni-P electrodeposited with 0 and 0.01 g/L thiourea were relatively smooth and clean showing no nodules, whereas, the cauliflower-like nodules were observed on the surfaces of the deposits prepared with 0.03, 0.05, 0.07 and 0.1 g/L thiourea. The surface roughness (Rrms) of the deposits increased by addition of 0.1 ppm of thiourea from 6 to 54 nm. Nano-mechanical properties of the Ni-P foil such as elastic modulus, hardness and stiffness determined by tribo-nano-indenter were tended to increase by addition of 0.1 ppm of thiourea from 77 to 156 GPa, 6.6 to 8.9 GPa and 109.6 to 186.6 uN/nm, respectively.
机译:研究了Thiourea对Ni-P箔的纳米机和化学性质的影响,为汽车和机械零件进行了高性能Ni-P沉积物。通过用不同量的硫脲在改性硫酸盐浴中进行电铸制备Ni-P沉积。通过能量分散光谱的电沉积Ni-P箔的化学分析表明,用硫脲减少了箔中的磷。 X射线衍射测定的结构分析显示,Ni-P沉积物的(111)平面优先于越来越多的结晶度。通过原子力显微镜和现场 - 发射扫描电子显微镜的表面分析表明,Ni-P电沉积的表面和0.01g / L硫脲的表面相对光滑和清洁,显示没有结节,而观察到花椰菜状结节沉积物的表面含有0.03,0.05,0.07和0.1g / l硫脲。沉积物的表面粗糙度(RRMS)通过加入0.1ppm的硫脲,从6至54nm增加。 Ni-P箔的纳米力学性能如摩擦纳米压痕测定的弹性模量,硬度和刚度,通过加入0.1ppm的硫脲,从77-156GPa,6.6至8.9GPa和109.6至186.6增加分别为UN / NM。

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