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Fabrication of YSZ solid electrolyte for solid oxide fuel cells by RF reactive sputtering

机译:RF反应溅射对固体电解质的ysz固体电解质制备

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摘要

Yttria stabilized zirconia(YSZ) thin film electrolytefor solid oxide fuel cells(SOFCs) was reactively deposited by RFsputtering and its mechanical and electrical properties werecharacterized. Deposition rate of 8 mol% YSZ thin film was about100A/mm under the sputtering conditions of 14% of oxygen flowratio and 6.6 W/cm~2 of RF power density. Furthermore, surfaceroughness of YSZ thin films increased with increasing yttriacontent in the films and fine grain4ike particles were considerablyappeared, especially, in 8 mol% YSZ thin film. It was thought thatthese fine grain4ike particles were caused by un-resolved yttria andthat these were considerably reduced by post-annealing at 500 degC for 1 hr. The electrical conductivity of a triple layered 8 mol%YSZI3 mol% YSZI8 mol% YSZ thin film stack at 9000C wasslightly lower than that of a single layered 8 mol% YSZ thin filmwhich was most widely used solid electrolytes for SOFCs.However, the triple layered 8 mol% YSZ/3 mol% YSZI8 mol%YSZ thin film had lower compress stress and better microhardness than8 mol% YSZ thin films, exhibiting a possibility of application to SOFCs.
机译:通过RFSPTINGENTTERING和其机械和电学性能沉积钇稳定氧化锆(YSZ)薄膜电解质固体氧化物燃料电池(SOFC)。 8mol%YSZ薄膜的沉积速率在溅射条件下为约100A / mm,14%的氧流量和RF功率密度的6.6W / cm〜2。此外,YSZ薄膜的表面上随着薄膜中的ytTriventent的增加而增加,细粒4粒颗粒显着,特别是在8mol%YSZ薄膜中。据认为,这些细粒4粒颗粒是由未分辨的ytTRIA引起的,并且通过在500 degc下进行1小时的退火而显着降低。三层8mol%YSZI3摩尔%YSZI8MOL%YSZ薄膜叠层的电导率在9000CWastly的低于单层8mol%YSZ薄膜的薄膜,为SOFCS进行最广泛使用的固体电解质。然而,三层层叠8mol%YSZ / 3mol%YSZI8Mol%YSZ薄膜具有较低的压缩应力和更好的微硬度,优于8摩尔%YSZ薄膜,表现出应用于SOFC的可能性。

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