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Different RISC rates in benzoylpyridine-based TADF compounds and their implications for solution-processed OLEDs

机译:基于苯甲酰吡啶的TADF化合物的不同RISC速率及其对溶液加工OLED的影响

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Reverse intersystem crossing (RISC) rate is among the key parameters of TADF compounds affecting triplet upconversion and annihilation processes, and thus determining efficiency roll-off in TADF-OLEDs. Herein, control of RISC rate (k(RISC)) in a series of benzoylpyridine-based TADF compounds via carbazole donor linking positions is demonstrated. Regardless of the similar singlet-triplet energy splitting found in the compounds with meta- or para-carbazole linking topologies, meta-Cz compounds exhibited stronger singlet-triplet state coupling resulting in 10-fold larger k(RISC) (up to similar to 2 x 10(6) s(-1)) as that in para-Cz counterparts. Different k(RISC) was shown to have important implications for the solution-processed TADF-OLEDs based on the benzoylpyridines. Explicitly, in the non-doped devices based on neat meta-Cz emissive layers, larger k(RISC) was crucial for the reduced roll-off. Conversely, in 1.2 wt% rubrene-doped hyperfluorescent devices employing benzoylpyridines as TADF hosts, insignificant roll-off was observed irrespective of k(RISC), provided it is above 10(5) s(-1). The obtained results give insight into the possibilities of controlling k(RISC) in benzoylpyridines and demonstrate its importance for efficiency roll-off of TADF and hyperfluorescent OLEDs.
机译:反向间隔交叉(RISC)率是影响TRADF化合物的关键参数,影响TRADF-OLED中的效率滚动。在此,证明了通过咔唑供体连接位置的一系列基于苯甲酰基吡啶的TADF化合物的RISC率(K(RISC))的控制。无论在具有Meta-或对咔唑链接拓扑的化合物中发现的类似单态三态能量分裂,Meta-CZ化合物表现出较强的单态三重态偶联,导致10倍较大的K(RISC)(最高类似于2 x 10(6)s(-1))如在PARA-CZ对应物中。显示不同的K(RISC)对于基于苯甲酰吡啶的溶液加工的Tadf-OLED具有重要意义。明确地,在基于整齐的元CZ发光层的非掺杂器件中,较大的K(RISC)对于减少的滚动至关重要。相反,在1.2wt%的肾上腺掺杂的高潮装置中使用苯甲酰吡啶作为塔德夫宿主,无论K(RISC)如何观察到不显着的滚动,只要它高于10(5)次(-1)。所获得的结果能够了解控制苯甲酰吡啶的K(RISC)的可能性,并证明其对TADF和Hyperflorescences OLED的效率滚动的重要性。

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