首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Visible light active photocatalytic C-doped titanium dioxide films deposited via reactive pulsed DC magnetron co-sputtering: Properties and photocatalytic activity
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Visible light active photocatalytic C-doped titanium dioxide films deposited via reactive pulsed DC magnetron co-sputtering: Properties and photocatalytic activity

机译:可见光活性光催化C掺杂二氧化钛薄膜通过反应性脉冲DC磁控磁阻会沉积:性能和光催化活性

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摘要

Doping of TiO2 with carbon is known to be an efficient method of enhancing visible light photocatalytic activity. The present work describes the deposition of carbon-doped titania coatings deposited by reactive magnetron co-sputtering of Ti and C targets. Undoped titania coatings were produced under similar deposition conditions for comparison purposes. Following deposition, all coatings were annealed in air at 873 K for 30 min to develop the required crystalline structure; and then analysed with EDS, XRD, AFM, XPS and UV-visible spectrophotometry. A number of tests, including methylene blue and stearic acid decomposition tests, and photo-induced hydrophilicity measurements, were employed for the assessment of the photocatalytic properties of the C-doped and un-doped titanium dioxide coatings under UV and visible light irradiation. It was found that carbon-doped titania coatings significantly outperformed undoped titania when using both visible and UV irradiation. Similar trends were observed for other properties. While excessive carbon doping has been shown to have a negative effect on the photocatalytic properties of the titanium dioxide, overall, carbon doping via reactive co-sputtering has been confirmed as an efficient method of photocatalytic property enhancement. This is due to a narrowing of the bandgap and to extended lifetimes of the photo-generated charge carriers. (C) 2018 Elsevier Ltd. All rights reserved.
机译:已知用碳掺杂TiO 2是增强可见光光催化活性的有效方法。本作者描述了通过Ti和C靶的反应磁控凝固沉积的碳掺杂二氧化钛涂层的沉积。在类似的沉积条件下生产未掺杂的二氧化钛涂层以进行比较。沉积后,将所有涂层在873k的空气中退火30分钟以产生所需的结晶结构;然后用EDS,XRD,AFM,XPS和UV可见分光光度法分析。使用许多试验,包括亚甲基蓝和硬脂酸分解试验和光诱导的亲水性测量,用于评估UV和可见光照射下的C掺杂和未掺杂二氧化钛涂层的光催化性质。发现使用透明和紫外线照射时,碳掺杂的二氧化钛涂层显着优于未掺杂的二氧化钛。对于其他性质,观察到类似的趋势。虽然已经显示过过量的碳掺杂对二氧化钛的光催化性能产生负面影响,但总体而言,通过反应性副溅射的碳掺杂已被证实为光催化性能增强的有效方法。这是由于带隙的缩小并延长了光产生的电荷载体的寿命。 (c)2018年elestvier有限公司保留所有权利。

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