首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >The improved corrosion resistance of sputtered CrN thin films with Cr-ion bombardment layer by layer
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The improved corrosion resistance of sputtered CrN thin films with Cr-ion bombardment layer by layer

机译:通过层用Cr离子轰击层的溅射CRN薄膜的耐腐蚀性

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The sputtered CrN coatings, which were bombarded by the energetic Cr-ion via filtered arc ion plating layer by layer, were prepared to improve the corrosion resistance of the coated samples. By controlling the times of Cr ion bombardment, the influence of the Cr ion bombarding of the sputtered CrN-were investigated from the aspect of the microstructure and corrosion behavior. The results indicated that the CrN film showed a suppressed effect on the coarse columnar structure and a more compact structure with lower porosity by introducing the Cr-ion bombardment. Potentiodynamic polarization curves showed that the CrN coated samples had an obvious improved corrosion resistance after the energetic Cr ion bombardment. With the bombarding times of Cr ion increasing from four to ten, the corrosion resistance of CrN coated samples showed a further improvement with corrosion potential increased about 100 mV and the corrosion current density decreased more than one order of magnitude when compared with the non -bombarded CrN coating. (C) 2017 Elsevier Ltd. All rights reserved.
机译:通过通过过滤的电弧离子镀层通过过滤的电弧离子轰击的溅射的CRN涂层被制备,以改善涂覆样品的耐腐蚀性。通过控制Cr离子轰击的时间,从微观结构和腐蚀行为的方面研究了CR离子轰击溅射CRN的影响。结果表明,通过引入Cr离子轰击,CRN膜对粗柱结构的抑制效应和具有较低孔隙率的更紧凑的结构。电位动力学偏振曲线显示CRN涂覆的样品在能量CR离子轰击后具有明显改善的耐腐蚀性。随着Cr离子的轰击时间从4到10增加,CRN涂覆样品的耐腐蚀性显示出腐蚀电位的进一步改善,增加约100 mV,并且与非缔酸度相比,腐蚀电流密度降低了多种数量级。 CRN涂层。 (c)2017 Elsevier Ltd.保留所有权利。

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