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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >100 MeV Silicon(9+) swift heavy ion irradiation - Strategic defect annealing approach to enhance the electrical conductivity of few-layered MoS2 sheets - PVA nanocomposite film
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100 MeV Silicon(9+) swift heavy ion irradiation - Strategic defect annealing approach to enhance the electrical conductivity of few-layered MoS2 sheets - PVA nanocomposite film

机译:100 MeV硅(9+)SWIFT重离子辐射 - 战略缺陷退火方法,提高少层MOS2薄膜的电导率 - PVA纳米复合膜

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摘要

In this study, we report a strategic route to enhance the electrical conductivity of solvent exfoliated MoS2 nanosheets dispersed in Poly-vinyl alcohol (PVA) matrix as a free-standing thin film. 100 MeV Silicon(9+) swift ion beam is used to anneal the defects and decrease the degree of disordemess of MoS2 while in the polymer matrix. Homogeneous dispersion and strong interfacial interaction between the nano-sheets and PVA matrix increases the charge carrier mobility, which in turn results in a dynamic increase of conductivity by 2 orders of magnitude i.e. from 2.5 x 10 (-5) S/cm (pristine) to 2.9 x 10(-3) S/cm (irradiated) at a fluence of 1 x 10(11) ions/cm(2).
机译:在这项研究中,我们报告了一种战略途径,以提高分散在聚乙烯醇(PVA)基质中的溶剂剥离MOS2纳米片的导电率作为自由静物薄膜。 100 MeV硅(9+)SWIFT离子束用于在聚合物基质中造成缺陷并降低MOS2的障碍程度。 纳米片和PVA基质之间的均匀分散和强的界面相互作用增加了电荷载流子迁移率,这又导致电导率的动态增加2级,即在2.5×10( - 5)S / cm(原始) 向2.9×10(-3)S / cm(辐照),流量为1×10(11)离子/ cm(2)。

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