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Cu segregation at alpha-Al (111)/delta '-Al3Li (111) interface

机译:Alpha-Al(111)/ delta'-al3li(111)接口的Cu偏析

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Segregation behaviors of Cu at alpha-Al (1 1 1) (1 1 1)delta'-Al3Li (1 1 1) interface were investigated with the first-principle pseudopotential plane-wave method. The results show that the most stable atomic coordination relations for alpha-Al (1 1 1)/delta'-Al3Li (1 1 1) interface is the structure of which the ABC stacking order of FCC lattice along (1 1 1) direction is kept at both two interfaces of Al and Al3Li phases. At 1/4 ML coverage, Cu atom is inclined to be segregated at alpha-Al (1 1 1)/delta'-Al3Li (1 1 1) interface by adopting the interstitial rather than the substitution mode. The favorite interstitial site is the position where Cu atom is surrounded by three symmetrical Al atoms. Based on the calculation of separation work, we predicted that interstitial Cu can effectively improve the strength of the whole interface region, especially the area inside Al matrix, this is in agreement with the experimental results.
机译:采用第一原理假势平面波法研究了α-Al(111)(111)(111)(111)δ-Al3Li(111)界面的仲裁行为。 结果表明,α-Al(1 1 1)/ delta'--Al3li(111)接口的最稳定的原子协调关系是FCC晶格沿(1 1 1)方向的ABC堆叠顺序的结构 在Al和Al3li阶段的两个界面处保持。 在1/4ml覆盖范围内,Cu原子倾斜以通过采用间质而不是替代模式在α-Al(111)/Δ--Al3Li(111)界面处进行分离。 最喜欢的间隙位点是Cu原子被三个对称AL原子包围的位置。 基于分离工作的计算,我们预测间隙Cu可以有效地提高整个界面区域的强度,尤其是Al基质内的区域,这与实验结果一致。

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