THE DETECTION AND THE CONTROL OF MACHINE/CHAMBER MISMATCHING IN SEMICONDUCTORMANUFACTURING

摘要

Achieving desired yields in advanced manufacturing industries, as is the case for semiconductor fabrication, requires perfectly matching the performance of parallel machines/chambers at all production steps. Moreover, in the high-mix/low-volume manufacturing environment of the IC makers, the need for highly precise production processes makes the task of matching identical machines/chambers more and more complicated and challenging. In this paper, a methodical approach to deal with machine/chamber mismatching using all available data such as sensor data, product measurements, and maintenance log is proposed and validated with real practices. In fact, after detecting and identifying the key variables source of variance in the process, a modeling step known as Virtual Metrology is performed to quantify accurately the recipe adjustments i.e., R2R control, which will match as much as possible both sensor data and metrology measurements between similar machines/chambers.