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机译:从196到1688nm(0.735-6.33ev)的SiO_2光学常数从20,40和60nm的反应溅射SiO_2上的Eagle XG〜? 玻璃通过光谱椭圆形测定法
Department of Chemistry and Biochemistry Brigham Young University C100 BNSN Provo Utah 84602;
Department of Chemistry and Biochemistry Brigham Young University C100 BNSN Provo Utah 84602;
Department of Physics and Astronomy Brigham Young University N283 ESC Provo Utah 84602;
Department of Information Technology Brigham Young University 265 CTB Provo Utah 84602;
Science and Technology Division Corning Incorporated SP-FR-02-10 Corning New York 14831;
J. A. Woollam Co. Inc. 645 M Street Suite 102 Lincoln Nebraska 68508;
Department of Chemistry and Biochemistry Brigham Young University C100 BNSN Provo Utah 84602;
Eagle XGVR; SiO_2; silica; reactive sputtering; spectroscopic ellipsometry; BEMA; pole–pole; Sellmeier;
机译:从196到1688nm(0.735-6.33ev)的SiO_2光学常数从20,40和60nm的反应溅射SiO_2上的Eagle XG〜? 玻璃通过光谱椭圆形测定法
机译:直流磁控溅射制备SiO_2 / CdTe纳米复合薄膜的光谱椭圆
机译:掺钛的SiO_2介孔薄膜的光学特性的光谱椭偏表征
机译:直流溅射的光学常数来源于ITO,TiO2和TiO2:Nb薄 用分光光度法和光谱椭偏仪测定的薄膜 光电器件