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首页> 外文期刊>Small >Dielectric-Screening Reduction-Induced Large Transport Gap in Suspended Sub-10 nm Graphene Nanoribbon Functional Devices
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Dielectric-Screening Reduction-Induced Large Transport Gap in Suspended Sub-10 nm Graphene Nanoribbon Functional Devices

机译:介电筛选诱导诱导悬浮亚10 nm石墨烯纳米型功能装置的大型运输间隙

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摘要

The predicted quasiparticle energy gap of more than 1 eV in sub-6 nm graphene nanoribbons (GNRs) is elusive, as it is strongly suppressed by the substrate dielectric screening. The number of techniques that can produce suspended highquality and electrically contacted GNRs is small. The helium ion beam milling technique is capable of achieving sub-5 nm patterning; however, the functional device fabrication and the electrical characteristics are not yet reported. Here, the electrical transport measurement of suspended ≈6 nm wide mono- and bilayer GNR functional devices is reported, which are obtained through sub-nanometer resolution helium ion beam milling with controlled total helium ion budget. The transport gap opening of 0.16-0.8 eV is observed at room temperature. The measured transport gap of the different edge orientated GNRs is in good agreement with first-principles simulation results. The enhanced electron- electron interaction and reduced dielectric screening in the suspended quasi-1D GNRs and anti-ferromagnetic coupling between opposite edges in the zigzag GNRs substantiate the observed large transport gap.
机译:在Sub-6nm Graphene纳米中(GnRS)中预测的Quasiparticle能量差距超过1eV,难以捉摸,因为它受基板电介质筛选强制抑制。可以产生悬浮高度和电接触的GNR的技术数量小。氦离子束铣削技术能够实现Sub-5 NM图案化;然而,尚未报道功能装置制造和电气特性。这里,报告了悬浮的悬浮≈6NM宽的单声和双层GNR功能装置的电气传输测量,其通过具有受控全氦离子预算的子纳米分辨率氦离子束铣削获得。在室温下观察到0.16-0.8eV的运输间隙开口。定向为定向的GNR的测量的传输差距与第一原理模拟结果吻合良好。增强的电子相互作用和降低的悬浮的准1D GNR中的电介质筛选和Z字形GNR中的相对边缘之间的抗铁磁耦合证实了观察到的大型运输间隙。

著录项

  • 来源
    《Small》 |2019年第46期|共7页
  • 作者单位

    School of Materials Science Japan Advanced Institute of Science and Technology 1-1 Asahidai Nomi Ishikawa 923-1292 Japan;

    School of Materials Science Japan Advanced Institute of Science and Technology 1-1 Asahidai Nomi Ishikawa 923-1292 Japan;

    School of Materials Science Japan Advanced Institute of Science and Technology 1-1 Asahidai Nomi Ishikawa 923-1292 Japan;

    School of Materials Science Japan Advanced Institute of Science and Technology 1-1 Asahidai Nomi Ishikawa 923-1292 Japan;

    School of Materials Science Japan Advanced Institute of Science and Technology 1-1 Asahidai Nomi Ishikawa 923-1292 Japan;

    School of Materials Science Japan Advanced Institute of Science and Technology 1-1 Asahidai Nomi Ishikawa 923-1292 Japan;

    Nanoelectronics Research Institute National Institute of Advanced Industrial Science and Technology (AIST) 16-1 Onogawa Tsukuba 305-8569 Japan;

    School of Materials Science Japan Advanced Institute of Science and Technology 1-1 Asahidai Nomi Ishikawa 923-1292 Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

    anti-ferromagnetic insulating ground state; dielectric screening; graphene nanoribbons; helium ion beam milling; transport gap;

    机译:抗铁磁绝缘地;介电筛选;石墨烯纳米梁;氦离子梁铣削;运输差距;

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