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机译:Zn <下标> 2 下标> SNO <下标> 4 下标>薄膜的表征,由RF磁控溅射制备
College of Materials Science and Engineering Sichuan University;
College of Materials Science and Engineering Sichuan University;
College of Materials Science and Engineering Sichuan University;
College of Materials Science and Engineering Sichuan University;
College of Materials Science and Engineering Sichuan University;
College of Materials Science and Engineering Sichuan University;
College of Materials Science and Engineering Sichuan University;
College of Materials Science and Engineering Sichuan University;
College of Materials Science and Engineering Sichuan University;
Zn2SnO4; ceramic target; RF magnetron sputtering; oxygen content; annealing;
机译:Zn <下标> 2 下标> SNO <下标> 4 下标>薄膜的表征,由RF磁控溅射制备
机译:电子束照射对由RF磁控溅射制备的<下标> 2 下标> o <下标> 3 下标>薄膜Cu-掺杂结构和光学性质的影响
机译:射频溅射沉积作为阴极材料的多孔NASICON型Li
机译:射频磁控溅射共溅射Au / SiO
机译:通过直角磁控溅射制备的生物医学应用羟基磷灰石薄膜的表征。
机译:射频磁控溅射在不同N2 / Ar气体流量下生长的Zn3N2薄膜的XPS深度剖面分析
机译:(La [下标1-y] sr [下标y])[下标2] CoO [下标4±δ] / La [下标1-x] sr [下标x] CoO [下标3-]中的异常界面和表面锶偏析δ]异质结构薄膜