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Deposition of Gold Nanoparticles on Silicon in the Pulse Mode of Electrolysis in a DMSO Solution

机译:沉积在DMSO溶液中电解脉冲模式中的硅纳米颗粒

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We study the deposition of gold nanoparticles (AuNPs) on a surface of silicon in the pulse mode of electrolysis in dimethyl sulfoxide solutions of 2-8 mM HAuCl4 under the potentials E = (- 1.6) - (- 2.2) V. It is shown that, in the course of electrodeposition, we observe the predominant 2D filling of the substrate surface with deposits, ranging from the nanosized discrete particles to nanostructured porous films. It is shown that the geometry of AuNPs is mainly affected by the cathode potential, the concentration of ions of the reduced metal, and the duration of electrolysis. It is also demonstrated that gold nanoparticles 50-100 nm in size are formed in a medium of an organic aprotic solvent. We present the results of atomic-force and scanning electron microscopies and the histograms of distributions of particles in sizes depending on the conditions of electrolysis.
机译:我们在电位E =( - 1.6) - ( - 2.2)V的二甲基亚砜溶液中,在电解的脉冲模式下,研究了金纳米颗粒(AUNP)的沉积在脉冲模式下。 即,在电沉积过程中,我们观察到具有沉积物的基板表面的主要2D填充,从纳米型离散颗粒到纳米结构多孔膜。 结果表明,AUNP的几何形状主要受阴极电位的影响,降低金属离子的浓度,以及电解的持续时间。 还证明了金纳米颗粒的尺寸为50-100nm,形成有机非质子溶剂的介质。 根据电解条件,我们介绍了原子力和扫描电子显微镜的结果和粒子分布的直径尺寸。

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