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Color Brightness of RGB Light Sources Covered by Anti-Reflective Nanoimprinted Films

机译:RGB光源的颜色亮度由抗反射纳米修印膜覆盖

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摘要

Single-and double-sided imprinted anti-reflective (AR) films with conical nanopatterns were fabricated using an ultraviolet nanoimprint lithography process, and their anti-reflection performances are studied considering the effects of RGB display backlight. The effects of the fabricated AR films on the RGB color generated by reflection were evaluated to understand the contribution of backlight on anti-reflection performance. It was found that the fabricated double-sided imprinted AR film on PMMA exhibited anti-reflective performance with transmittance of 96.76% and reflectance of 0.55% at a wavelength of 550 nm. Additionally, the measurements on the target to background ratio of RGB pigments covered with the studied films showed that the detrimental effect of the double-sided imprinted film was smallest owing to the high transmittance and low reflectance of the double-sided nanopatterns.
机译:使用紫外线印刷光刻工艺制造具有锥形纳米模式的单侧和双面印迹抗反射(AR)膜,研究了考虑RGB显示背光的影响的抗反射性能。 评估了由反射产生的RGB颜色对RGB颜色的影响,以了解背光对抗反射性能的贡献。 发现PMMA上的制造的双面印迹Ar膜表现出抗反射性能,透射率为96.76%,反射率为550nm的波长0.55%。 另外,靶向研究薄膜的RGB颜料的背景比的测量结果表明,由于双面纳米透明图案的高透射率和低反射率,双面印迹膜的不利影响最小。

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