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Reactive oxygen species generation by copper(II) oxide nanoparticles determined by DNA damage assays and EPR spectroscopy

机译:通过DNA损伤测定和EPR光谱法测定的铜(II)氧化物纳米粒子产生的活性氧物种

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Copper(II) oxide nanoparticles ((CuO)-Cu-NP) have many industrial applications, but are highly cytotoxic because they generate reactive oxygen species (ROS). It is unknown whether the damaging ROS are generated primarily from copper leached from the nanoparticles, or whether the nanoparticle surface plays a significant role. To address this question, we separated nanoparticles from the supernatant containing dissolved copper, and measured their ability to damage plasmid DNA with addition of hydrogen peroxide, ascorbate, or both. While DNA damage from the supernatant (measured using an electrophoresis assay) can be explained solely by dissolved copper ions, damage by the nanoparticles in the presence of ascorbate is an order of magnitude higher than can be explained by dissolved copper and must, therefore, depend primarily upon the nanoparticle surface. DNA damage is time-dependent, with shorter incubation times resulting in higher EC50 values. Hydroxyl radical ((OH)-O-center dot) is the main ROS generated by (CuO)-Cu-NP/hydrogen peroxide as determined by EPR measurements; (CuO)-Cu-NP/hydrogen peroxide/ascorbate conditions generate ascorbyl, hydroxyl, and superoxide radicals. Thus, (CuO)-Cu-NP generate ROS through several mechanisms, likely including Fenton-like and Haber-Weiss reactions from the surface or dissolved copper ions. The same radical species were observed when (CuO)-Cu-NP suspensions were replaced with the supernatant containing leached copper, washed (CuO)-Cu-NP, or dissolved copper solutions. Overall, (CuO)-Cu-NP generate significantly more ROS and DNA damage in the presence of ascorbate than can be explained simply from dissolved copper, and the (CuO)-Cu-NP surface must play a large role.
机译:铜(II)氧化铝纳米粒子((CUO)-Cu-NP)具有许多工业应用,但是高度细胞毒性,因为它们产生反应性氧(ROS)。尚不清楚是否从纳米颗粒浸出的铜产生损坏的ROS,或者纳米颗粒表面是否发挥重要作用。为了解决这个问题,我们将纳米颗粒从含有溶解的铜的上清液分离,并测量它们在加入过氧化氢,抗坏血酸或两者的损害质粒DNA的能力。虽然可以仅通过溶解的铜离子来解释来自上清液的DNA损伤(测量的电泳测定),但是在抗坏血酸盐存在下纳米颗粒的损伤是比溶解铜的溶胀高,并且因此必须取决于诸如溶解的铜的数量级主要在纳米颗粒表面上。 DNA损伤是时间依赖性的,孵化时间较短,导致EC50值更高。羟基自由基((OH)-O中心点)是由EPR测量确定的(CuO)-Cu-NP /氢过氧化氢产生的主要ROS; (CuO)-Cu-NP /氢过氧化氢/抗坏血酸条件产生抗坏血酸,羟基和超氧化物自由基。因此,(CUO)-CU-NP通过几种机制产生RO,可能包括从表面或溶解的铜离子的FENTON样和HABER-WEISS反应。当用含有浸出的铜的上清液取代(CuO)-Cu-NP悬浮液时,观察到相同的根治性物种,洗涤(CuO)-Cu-NP或溶解铜溶液。总体而言(CUO)-Cu-NP在抗坏血酸盐存在下产生显着更多的ROS和DNA损伤,而不是简单地从溶解的铜中解释,而(CUO)-Cu-NP表面必须发挥大作用。

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