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A facile deposition method for CuSCN: Exploring the influence of CuSCN on J-V hysteresis in planar perovskite solar cells

机译:CUSCN的容易沉积方法:探讨CUSCN对Palovskite太阳能电池平面J-V滞后的影响

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摘要

Inorganic hole-transporting materials (HTMs) are a promising class of compounds for improving the long-term stability of perovskite solar cells. In this study, copper(I) thiocyanate ( CuSCN) has been applied as an HTM in planar-structured thin film perovskite solar cells based on methylammonium lead(II) triiodide. A common obstacle associated with the deposition of inorganic HTMs in perovskite-based solar cell devices is the damaging effect of polar solvents, required during the solution-processed deposition step, on the underlying perovskite film. Here we describe a novel fabrication method that allows the deposition of a CuCSN layer on perovskite film, achieving a maximum power conversion efficiency of 9.6%. The magnitude of J-V hysteresis is found to be strongly dependent on the HTM used, with the phenomenon being much more prevalent in the CuSCN- and spiro-OMeTAD-based devices compared to CuI-based devices. Interestingly, CuSCN and CuI showed significantly different J-V hysteresis behaviors despite their similar physicochemical properties. Further characterization by open circuit voltage decay (OCVD) measurements revealed that the relaxation of the perovskite polarization depends on the light intensity and the adjacent HTM layer. We propose that the stronger J-V hysteresis in CuSCN compared to CuI is a result of defects generated during the deposition process and possible degradation at the material interfaces while other possibilities are also discussed.
机译:无机空穴传输材料(HTMS)是一种有望的类化合物,用于改善钙钛矿太阳能电池的长期稳定性。在该研究中,基于甲基鎓铅(II)三碘化甲基铅(II),铜(I)硫氰酸铜(I)硫氰酸酯(CUSCN)被用作平面结构薄膜钙钛矿太阳能电池中的HTM。与基于钙钛矿的太阳能电池装置中的无机HTM沉积相关的常见障碍是极性溶剂在溶液加工的沉积步骤中所需的极性溶剂的损害效果,在下面的钙钛矿膜上。在这里,我们描述了一种新的制造方法,其允许在钙钛矿膜上沉积CUCSN层,实现最大功率转换效率为9.6%。发现J-V滞后的幅度强烈依赖于所用的HTM,与基于CUI的器件相比,基于CUSCN和螺纹综合组的装置中的现象更普遍。有趣的是,尽管有类似的物理化学性质,Cuscn和Cui表现出显着不同的J-V滞后行为。通过开路电压衰减的进一步表征(OCVD)测量显示,钙钛矿偏振的松弛取决于光强度和相邻的HTM层。我们提出与CUI相比,CUSCN中的较强的J-V滞后是在沉积过程中产生的缺陷以及材料界面的可能降解,而其他可能性也在其他可能性。

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