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Effect of F-doping on temperature dependence of resistivity of vanadium pentoxide thin films prepared by spray pyrolysis

机译:F掺杂对喷雾热解制备钒五氧化钒薄膜电阻率温度依赖性的影响

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摘要

This paper reports structural and electrical characteristics of F-doped beta V2O5 thin films of different F concentrations. The films were analyzed by X-ray diffraction. It was found that F-doping in vanadium pentoxide affects the crystallinity of the samples. The SEM images have shown that by increasing the F-doping level, the size of the nanobelt increases. Electrical measurements indicated that the F-doping in beta V2O5 makes the temperature of phase transition change from semiconductor to metallic phase.
机译:本文报道了不同F浓度的F掺杂βV2O5薄膜的结构和电学特性。 通过X射线衍射分析薄膜。 发现钒五氧化钒的F掺杂会影响样品的结晶度。 SEM图像表明,通过增加F掺杂水平,纳米杆的尺寸增加。 电测量表明,βV2O5中的F掺杂使得从半导体变为金属相的相变变化。

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