首页> 外文期刊>Microchemical Journal: Devoted to the Application of Microtechniques in all Branches of Science >Low cost thiol-functionalized mesoporous silica, KIT-6-SH, as a useful adsorbent for cadmium ions removal: A study on the adsorption isotherms and kinetics of KIT-6-SH
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Low cost thiol-functionalized mesoporous silica, KIT-6-SH, as a useful adsorbent for cadmium ions removal: A study on the adsorption isotherms and kinetics of KIT-6-SH

机译:低成本硫醇官能化的介孔二氧化硅,试剂盒-6-SH,作为镉离子的有用吸附剂清除:对KIT-6-SH的吸附等温线和动力学的研究

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摘要

In this study, we have prepared and characterized 3-(trimethoxysilyl)-1-propanethiol functionalized mesoporous silica, KIT-6-SH, then investigated its efficacy in the sense of cadmium removal. KIT-6-SH was characterized by FT-IR spectroscopy, TGA, X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM). The obliteration of cadmium ions by HIT-6-SH was found to be mainly governed by surface adsorption. The elimination of cadmium ions from aqueous solutions was conducted using a batch method. Factors including the initial metal ion concentration, pH, and contact time were determined to be influential parameters on the sorption process. The sorption isotherm data were clearly described by the Langmuir model and maximum adsorption capacity for KIT-6-SH was 85 mg g(-1). Moreover, a pseudo-second-order kinetic model was found to govern the sorption kinetics. According to these findings, it can be concluded that KIT-6-SH is well suited for the efficient and selective removal of cadmium ions from aqueous solutions.
机译:在这项研究中,我们制备并表征了3-(三甲氧基甲硅烷基)-1-丙硫醇官能化的介孔二氧化硅,试剂盒-6-SH,然后在去除镉感的疗效中研究其功效。 Kit-6-SH的特征在于FT-IR光谱,TGA,X射线衍射(XRD)和场发射扫描电子显微镜(Fe-SEM)。发现PIT-6-SH的镉离子的湮灭主要受表面吸附的管辖。使用分批方法对来自水溶液的镉离子消除。确定包括初始金属离子浓度,pH和接触时间的因素是对吸附过程的影响。通过Langmuir模型清楚地描述了吸附等温数据,并且Kit-6-SH的最大吸附能力为85mg g(-1)。此外,发现伪二阶动力学模型用于治理吸附动力学。根据这些发现,可以得出结论,Kit-6-SH非常适合于从水溶液中高效和选择性地除去镉离子。

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