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首页> 外文期刊>Materials science in semiconductor processing >Addressing the issue of under-utilization of precursor material in SILAR process: Simultaneous preparation of CdS in two different forms - Thin film and powder
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Addressing the issue of under-utilization of precursor material in SILAR process: Simultaneous preparation of CdS in two different forms - Thin film and powder

机译:解决Sill过程中前体材料的利用率的问题:以两种不同的形式同时制备CDS - 薄膜和粉末

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摘要

To overcome the major limitation of the successive ionic layer adsorption and reaction (SILAR) technique - the under-utilization of the precursor material - in the present work, simultaneous fabrication of CdS thin films and CdS powder is attempted.
机译:为了克服连续离子层吸附和反应(Sill)技术的主要限制 - 前体材料的利用率 - 在本作过程中,尝试同时制备Cds薄膜和Cds粉末。

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