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首页> 外文期刊>Materiali in Tehnologije >MICROSTRUCTURE EVOLUTION AND PROPERTY CHANGES OF Al-Si-Cu ALLOY BY CONTROLLING DIRECTIONAL SOLIDIFICATION PARAMETERS
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MICROSTRUCTURE EVOLUTION AND PROPERTY CHANGES OF Al-Si-Cu ALLOY BY CONTROLLING DIRECTIONAL SOLIDIFICATION PARAMETERS

机译:控制定向凝固参数的微观结构演化与Al-Si-Cu合金的性能变化

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As the properties of the Al-Si-Cu alloy depend on the microstructure, it is necessary to study the effects of processing parameters on the microstructure to control the properties of the Al-Si-Cu alloy. A novel Al-Si-Cu alloy rod was prepared using directional solidification (DS) of liquid metal cooling and the Al-Si-Cu alloy rod was investigated by using a scanning electron microscope (SEM), a JVJ-50s test machine, a MHVD-1000IS microhardness tester and a FT300 resistivity tester. The SEM was used to capture micrographs. The JVJ-50s test machine was employed to measure stress-strain relationships. The MHVD-1000IS microhardness tester was used to measure the microhardness of the specimens. The FT300 resistivity tester was used to evaluate the electrical conductivity. Experimental results indicate that the dendrite structure of the microstructure can be refined by increasing the melting temperatures during DS, but the exorbitant temperature would make the precipitated phase coarsen. It was found that when the melting temperature was 750 °C and the pulling rate was 300 μm-s~(-1) the maximum tension strength and microhardness were 232 MPa and 102 HV, respectively. Moreover, when the vacuum was 0.4 × 10~(-3) MPa, the electrical properties of the alloy are the best, i.e., the minimum resistivity was 17.6 μΩ-mm. Therefore, a set of optimum processing parameters, i.e., the melting temperature of 750 °C, the pulling rate of 300 urns' and the vacuum of 0.4 × 10~(-3) MPa, can be selected to improve the microstructure and properties of the Al-Si-Cu alloy.
机译:由于Al-Si-Cu合金的性质取决于微观结构,因此必须研究加工参数对控制Al-Si-Cu合金的性能的微观结构的影响。使用液态金属冷却的定向凝固(DS)制备新的Al-Si-Cu合金棒,并通过使用扫描电子显微镜(SEM)来研究Al-Si-Cu合金棒,JVJ-50S测试机器,a MHVD-1000IS微硬度测试仪和FT300电阻率测试仪。 SEM用于捕获显微照片。采用JVJ-50S测试机来测量应力 - 应变关系。 MHVD-1000IS微硬度测试仪用于测量样品的显微性。 FT300电阻率测试仪用于评估电导率。实验结果表明,微观结构的树突结构可以通过增加DS的熔化温度来改进,但过高的温度将使沉淀的相粗糙。发现,当熔化温度为750℃并且拉伸速率为300μm-s〜(-1)时,最大张力和微硬度分别为232MPa和102HV。此外,当真空为0.4×10〜(-3)MPa时,合金的电性能是最好的,即,最小电阻率为17.6μΩ-mm。因此,可以选择一组最佳处理参数,即750℃的熔化温度,300瓮的拉伸速率和0.4×10〜(-3)MPa的真空,以改善微观结构和性质Al-Si-Cu合金。

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