Investigation of the inuence of the discharge chamber 'loading' effect on the optical characteristics of resonator type microwave plasmatron

摘要

The investigation data of the inuence of the material, quantity and volume of plasma chemical processing objects on plasma formation in a discharge chamber of a microwave plasmatron are presented. The experiments are carried out in a microwave plasmatron with the applicator in the form of a rectangular cavity where resonant volume is partially filled with plasma. The plates of monocrystalline silicon, sitall and stainless steel are processing objects. Plasma diagnostics was carried out using such methods as optical emission spectroscopy and registration of integral optical luminosity of microwave discharge. The experimental results indicate that the microwave power magnitude expended on the initiation and maintenance of the discharge depends on the number of silicon plates in the processing zone. This effect can be explained both by a partial absorbing of microwave power plate material which has a high dielectric loss tangent, resonator Q-factor change and conditions of matching a discharge region with a waveguide tract.