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Monte Carlo Simulation Study of Electron Beam Interaction in Multi-Layered Semiconducting Materials

机译:多层半导体材料中电子束相互作用的蒙特卡罗模拟研究

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The Monte Carlo technique is applied to study electron solid interaction in multi-layered amorphous solid thin film of silicon carbide (SiC) with resist PMMA. We used electron beams of different initial energies impinging to the solid surface to trace the trajectory of primary electrons suffering scattering with different atoms of the multi-layered solid. Our simulation results show the stochastic behavior of the electron paths with different topology inside various thin films of PMMA, SiC and multi-layered PMMA-SiC solids. The decay in electron energy due to scattering as a function of lateral distance is found to be slower as the number of layers increases in both single and multi-layered films. We also found that electron paths spread out more laterally and impinge deeper inside the solid as the energy of the impinging electron increases. The primary electron energy in multi-layered PMMA-SiC as a function of lateral distance is found to decay slower as compared to that in SiC but faster as compared to that in PMMA.
机译:蒙特卡罗技术用于研究具有抗蚀剂PMMA的碳化硅(SiC)多层非晶固体薄膜中的电子固体相互作用。我们使用了入射到固体表面的不同初始能量的电子束,以追踪遭受多层固体不同原子散射的一次电子的轨迹。我们的仿真结果表明,在各种PMMA,SiC和多层PMMA-SiC固体薄膜中,具有不同拓扑结构的电子路径的随机行为。随着在单层和多层膜中层数的增加,由于散射而引起的电子能量的衰减随横向距离的变化而变慢。我们还发现,随着撞击电子的能量增加,电子路径向横向扩展,并向固体内部更深处撞击。发现多层PMMA-SiC中的一次电子能量随横向距离的变化比SiC中的慢,但比PMMA中的快。

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