Effects of Plasma Pretreatment on ZnO Deposition by SILAR on SiO        <sub >2</sub>2        , HfO        <sub >2</sub>2        , and Glass Substrates

Higgins Marissa; Pintor‐Monroy Maria Isabel; Quevedo‐Lopez Manuel

摘要

Abstract >Zinc oxide (ZnO) films are deposited onto glass, silicon oxide, and hafnium oxide substrates via the successive ionic layer adsorption and reaction (SILAR) method. The substrates are subjected to an oxygen plasma treatment prior to the deposition to increase the hydrophilic character of the film surface and improve the morphological and structural properties of the resulting ZnO films. Crystallinity, surface morphology, and thickness of the films with and without the plasma treatment are thoroughly evaluated by multiple characterization techniques. The oxygen plasma treatment increases the substrate's surface roughness significantly which results in an increase in the nucleation sites. The plasma treatment yields thicker films in all the substrates compared with substrates without the plasma treatment. The thickness of the ZnO deposited on glass substrates increases as the rinsing time increases, while the opposite is observed for films deposited on both silicon and hafnium oxide substrates. The higher porosity of the ZnO films grown on silicon dioxide and hafnium dioxide substrates leads to a higher surface area that increases the removal of the deposited ZnO on these substrates with the rinsing during the SILAR deposition, resulting in an overall thickness reduction of the film. </abstract> </span> <span class="z_kbtn z_kbtnclass hoverxs" style="display: none;">展开▼</span> </div> <div class="translation abstracttxt"> <span class="zhankaihshouqi fivelineshidden" id="abstract"> <span>机译：</span><Abstract Type =“Main”XML：Lang =“En”> <标题类型=“main”>摘要</标题> >氧化锌（ZnO）膜通过玻璃，氧化硅和铪氧化物基材通过连续离子层吸附与反应（Sill）方法。在沉积之前对基板进行氧等离子体处理，以增加膜表面的亲水性，提高所得ZnO膜的形态学和结构性质。通过多种表征技术彻底评估了具有和不具有等离子体处理的膜的结晶度，表面形貌和厚度。氧等离子体处理显着增加了基底的表面粗糙度，这导致成核位点的增加。与没有等离子体处理的基材相比，等离子体处理在所有基板中产生较厚的膜。沉积在玻璃基板上的ZnO的厚度随着漂洗时间的增加而增加，而沉积在硅和铪氧化物基材上的薄膜的膜观察到相反。在二氧化硅和二氧化铪基板上生长的ZnO膜的较高孔隙率导致更高的表面积，其随着在微观沉积期间用漂洗而增加在这些基板上的沉积ZnO的去除，导致膜的总厚度减小。 </ p> </ abstract> </span> <span class="z_kbtn z_kbtnclass hoverxs" style="display: none;">展开▼</span> </div> </div> <div class="record"> <h2 class="all_title" id="enpatent33" >著录项</h2> <ul> <li> <span class="lefttit">来源</span> <div style="width: 86%;vertical-align: text-top;display: inline-block;"> <a href='/journal-foreign-18164/'>《Crystal Research and Technology: Journal of Experimental and Industrial Crystallography》</a> <b style="margin: 0 2px;">|</b><span>2018年第8期</span><b style="margin: 0 2px;">|</b><span>共6页</span> </div> </li> <li> <div class="author"> <span class="lefttit">作者</span> <p id="fAuthorthree" class="threelineshidden zhankaihshouqi"> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Higgins Marissa&option=202" target="_blank" rel="nofollow">Higgins Marissa;</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Pintor‐Monroy Maria Isabel&option=202" target="_blank" rel="nofollow">Pintor‐Monroy Maria Isabel;</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Quevedo‐Lopez Manuel&option=202" target="_blank" rel="nofollow">Quevedo‐Lopez Manuel;</a> </p> <span class="z_kbtnclass z_kbtnclassall hoverxs" id="zkzz" style="display: none;">展开▼</span> </div> </li> <li> <div style="display: flex;"> <span class="lefttit">作者单位</span> <div style="position: relative;margin-left: 3px;max-width: 639px;"> <div class="threelineshidden zhankaihshouqi" id="fOrgthree"> <p>Department of Chemistry and BiochemistryUniversity of Texas at Dallas800 W Campbell Road Richardson TX 75080 USA;</p> <p>Department of Materials Science and EngineeringUniversity of Texas at Dallas800 W Campbell Road Richardson TX 75080 USA;</p> <p>Department of Chemistry and BiochemistryUniversity of Texas at Dallas800 W Campbell Road Richardson TX 75080 USA;</p> </div> <span class="z_kbtnclass z_kbtnclassall hoverxs" id="zhdw" style="display: none;">展开▼</span> </div> </div> </li> <li > <span class="lefttit">收录信息</span> <span style="width: 86%;vertical-align: text-top;display: inline-block;"></span> </li> <li> <span class="lefttit">原文格式</span> <span>PDF</span> </li> <li> <span class="lefttit">正文语种</span> <span>eng</span> </li> <li> <span class="lefttit">中图分类</span> <span><a href="https://www.zhangqiaokeyan.com/clc/160.html" title="晶体学">晶体学;</a></span> </li> <li class="antistop"> <span class="lefttit">关键词</span> <p style="width: 86%;vertical-align: text-top;"> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=oxygen plasma&option=203" rel="nofollow">oxygen plasma;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=plasma pretreatments&option=203" rel="nofollow">plasma pretreatments;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=successive ionic layer adsorption and reaction&option=203" rel="nofollow">successive ionic layer adsorption and reaction;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=surface treatments&option=203" rel="nofollow">surface treatments;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=zinc oxide&option=203" rel="nofollow">zinc oxide;</a> </p> <div class="translation"> 机译：氧等离子体;等离子体预处理;连续的离子层吸附和反应;表面处理;氧化锌; </div> </li> </ul> </div> </div> <div class="literature cardcommon"> <div class="similarity "> <h3 class="all_title" id="enpatent66">相似文献</h3> <div class="similaritytab clearfix"> <ul> <li class="active" >外文文献</li> <li >中文文献</li> <li >专利</li> </ul> </div> <div class="similarity_details"> <ul > <li> <div> <b>1. </b><a class="enjiyixqcontent" href="/journal-foreign-detail/0704022450825.html">Effects of Plasma Pretreatment on ZnO Deposition by SILAR on SiO <sub >2</sub>2 , HfO <sub >2</sub>2 , and Glass Substrates</a> <b>[J]</b> . <span> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Higgins Marissa&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor">Higgins Marissa,</a> <a 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tuijian_authcolor">,张东</a> <span> <a href="/journal-cn-7603/" target="_blank" rel="nofollow" class="tuijian_authcolor"> . 沈阳工程学院学报（自然科学版） </a> </span> <span> . 2015</span><span>,第002期</span> </span> </div> </li> <li> <div> <b>6. </b><a class="enjiyixqcontent" href="/academic-conference-cn_meeting-648_thesis/020221546716.html">TiO2对R2O-ZnO-CaO-SiO2玻璃结构及光学性能的影响</a> <b>[C]</b> <span> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=彭志钢&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor"> . 彭志钢</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=杜晓欧&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor">,杜晓欧</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=郑伟宏&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor">,郑伟宏</a> <span> <a href="/conference-cn-648/" target="_blank" rel="nofollow" class="tuijian_authcolor"> . 2015年全国玻璃科学技术年会 </a> <span> <span> . 2015</span> </span> </div> </li> <li> <div> <b>7. </b><a class="enjiyixqcontent" href="/academic-degree-domestic_mphd_thesis/02031547973.html">电解液浓度及沉积时间对阴极电沉积法制备ZnO薄膜的微结构及性能的影响</a> <b>[A] </b> <span> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=姚广&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor"> . 姚广</a> <span> . 2016</span> </span> </div> </li> </ul> <ul style="display: none;"> <li> <div> <b>1. </b><a class="enjiyixqcontent" href="/patent-detail/061203165748.html">在ZnO纳米柱阵列表面沉积生长ZnO纳米颗粒的方法</a> <b>[P]</b> . <span> 中国专利： CN106350786B </span> <span> . 2019.01.22</span> </div> </li> <li> <div> <b>2. </b><a class="enjiyixqcontent" href="/patent-detail/061202751231.html">用于在Ⅲ族氮化物基发光二极管上沉积外延ZnO的工艺及包括外延ZnO的发光二极管</a> <b>[P]</b> . <span> 中国专利： CN105190914B </span> <span> . 2018.01.26</span> </div> </li> <li> <div> <b>3. </b><a class="enjiyixqcontent" href="/patent-detail/06130427043043.html">LOW DIELECTRIC CONSTANT GLASS COMPOSITION CONTAINING SiO_2, B_2O_3, Al_2O_3, ZnO, AND ALKALI METAL OXIDE FOR PLASMA DISPLAY PANEL</a> <b>[P]</b> . <span> 外国专利：  KR20100050826A </span> <span> . 2010-05-14</span> </div> <p class="zwjiyix translation" style="max-width: initial;height: auto;word-break: break-all;white-space: initial;text-overflow: initial;overflow: initial;"> <span>机译：用于等离子体显示板的包含SiO_2，B_2O_3，Al_2O_3，ZnO和碱金属氧化物的低介电常数玻璃成分 </span> </p> </li> <li> <div> <b>4. </b><a class="enjiyixqcontent" href="/patent-detail/06130471079514.html">Binder glass of Bi.sub.2 O.sub.3 -SiO.sub.2 -GeO.sub.2 (-PbO optional) admixed with ZnO/ZnO and Bi.sub.2 O.sub.3</a> <b>[P]</b> . <span> 外国专利：  US4567151A </span> <span> . 1986-01-28</span> </div> <p class="zwjiyix translation" style="max-width: initial;height: auto;word-break: break-all;white-space: initial;text-overflow: initial;overflow: initial;"> <span>机译：Bi 2 O 3 -SiO 2 -GeO 2（-PbO可选）与ZnO / ZnO和Bi 2 O 3混合的粘结剂玻璃 </span> </p> </li> <li> <div> <b>5. </b><a class="enjiyixqcontent" href="/patent-detail/06130468763316.html">PLASMA CHEMICAL VAPOR DEPOSITIONS SIO.SUB.2 COATED ARTICLES AND PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION METHOD OF APPLYING THE COATING</a> <b>[P]</b> . <span> 外国专利：  CA1242616A </span> <span> . 1988-10-04</span> </div> <p class="zwjiyix translation" style="max-width: initial;height: auto;word-break: break-all;white-space: initial;text-overflow: initial;overflow: initial;"> <span>机译：等离子体化学气相沉积SIO.SUB.2涂层制品及等离子体辅助化学气相沉积方法 </span> </p> </li> </ul> </div> </div> </div> <div class="theme cardcommon" style="overflow: auto;display:none"> <h3 class="all_title" id="enpatent55">相关主题</h3> <ul id="subject"> </ul> </div> </div> </div> </div> <div class="right rightcon"> <div class="details_img cardcommon clearfix" style="margin-bottom: 10px;display:none;" > </div> </div> </div> <div id="thesis_get_original1" class="downloadBth" style="bottom: 19px;z-index: 999;" onclick="ywcd('0704022450825','4',7,2,1,'',this,24)" class="delivery" prompt="010401" 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Effects of Plasma Pretreatment on ZnO Deposition by SILAR on SiO 22 , HfO 22 , and Glass Substrates

摘要

Effects of Plasma Pretreatment on ZnO Deposition by SILAR on SiO ₂2 , HfO ₂2 , and Glass Substrates