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Growth of Sn-Doped beta-Ga2O3 Nanowires and Ga2O3-SnO2 Heterostructures for Gas Sensing Applications

机译:掺锡的β-Ga2O3纳米线和Ga2O3-SnO2异质结构在气体传感应用中的生长

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摘要

Although beta-Ga_2O_3 thin films and nanowires (NWs) show promise as very stable and reliable active components for high temperature gas sensors, their use at room temperatures is limited due to poor electrical conductivity. To address this problem, we grew Sn-doped beta-Ga_2O_3 nanowires by the vapor-liquid-solid (VLS) approach. Sn-doped beta-Ga_2O_3 NWs with diameters of 100-250 nm retained the monoclinic beta-Ga_2O_3 structure, though photoluminescence (PL) emission was red-shifted by up to 50 nm relative to the deep defect band typically observed for pure beta-Ga_2O_3 NWs. When higher amounts of Sri were introduced, individual Ga_2O_3-SnO_2 heterostructures (HS) self-assembled, to form three distinctive parts: monocrystalline Sn-doped beta-Ga_2O_3, poorly crystalline Sn-doped beta-Ga_2O_3, and polycrystalline Ga-doped SnO_2, thus realizing a p-n junction within a single HS. Factors responsible for the self-assembly of Ga_2O_3-SnO_2 HS are the different vapor pressures of Sri and Ga and different growth kinetics of Ga_2O_3 and SnO_2. Inhomogeneity in chemical content and structural composition correlated with distinct optical properties along the length of single HS. When diameters of these HS were less than 100 rim, Sn-doped Ga_2O_3 sections of the HS exhibited the rarely observed orthorhombic epsilon-Ga_2O_3 phase.
机译:尽管beta-Ga_2O_3薄膜和纳米线(NWs)有望成为用于高温气体传感器的非常稳定和可靠的活性成分,但由于导电性差,它们在室温下的使用受到限制。为了解决这个问题,我们通过汽液固(VLS)方法生长了掺Sn的β-Ga_2O_3纳米线。直径为100-250 nm的掺Snβ-Ga_2O_3NW保留了单斜晶β-Ga_2O_3结构,尽管相对于通常观察到的纯β-Ga_2O_3的深缺陷带,光致发光(PL)发射红移了最多50 nm。西北。当引入更多量的Sri时,单个Ga_2O_3-SnO_2异质结构(HS)自组装,形成三个独特的部分:单晶Sn掺杂的beta-Ga_2O_3,低结晶Sn掺杂的beta-Ga_2O_3和多晶Ga掺杂的SnO_2,从而在单个HS内实现pn结。 Ga_2O_3-SnO_2 HS自组装的主要因素是Sri和Ga的蒸气压不同,Ga_2O_3和SnO_2的生长动力学不同。化学含量和结构组成的不均匀性与沿单个HS的长度不同的光学性质相关。当这些HS的直径小于100 rim时,HS的Sn掺杂Ga_2O_3截面表现出很少观察到的正交晶ε-Ga_2O_3相。

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