Electron‐Blocking and Oxygen Evolution Catalyst Layers by Plasma‐Enhanced Atomic Layer Deposition of Nickel Oxide

Hufnagel Alexander G.; Hen? Ann‐Kathrin; Hoffmann Ramona; Zeman Otto E. O.; H?ringer Sebastian; Fattakhova‐Rohlfing Dina; Bein Thomas

摘要

Abstract > A plasma‐enhanced atomic layer deposition (ALD) process is presented, capable of producing thin conformal films of nickel(II) oxide (NiO) on various substrates. Nickelocene (NiCp <sub>2</sub> ) is used as an inexpensive metal precursor with oxygen plasma as the oxidant. The film growth rate saturates with both nickel precursor and plasma exposure. An ALD window is observed between 225 and 275 °C. Linear growth is achieved at 250 °C with a growth rate of 0.042 nm per cycle. The thickness is highly uniform and the surface roughness is below 1 nm rms for 52 nm thick films on Si(100). Substrates with aspect ratios up to 1:10 can be processed. As‐deposited, the films consist of polycrystalline, cubic NiO, and are transparent over the entire visible range with an optical bandgap of 3.7 eV. The films consist of stoichiometric NiO and contain ≈1% of carbon impurities. Two promising applications of these films are showcased in renewable energy conversion and storage devices: The films are pinhole‐free and exhibit excellent electron blocking capabilities, making them potential hole‐selective contact layers in solar cells. Also, high electrocatalytic activity of ultrathin NiO films is demonstrated for the alkaline oxygen evolution reaction, especially in electrolytes containing Fe 3+ . </abstract> </span> <span class="z_kbtn z_kbtnclass hoverxs" style="display: none;">展开▼</span> </div> <div class="translation abstracttxt"> <span class="zhankaihshouqi fivelineshidden" id="abstract"> <span>机译：</span><Abstract Type =“Main”XML：Lang =“en”> <标题类型=“main”>抽象</ title> > 提出了一种等离子体增强的原子层沉积（ALD）方法，能够在各种基材上产生氧化镍（II）氧化镍（NIO）的薄保形薄膜。 Nickelocene（Nicp. <sub> 2 </ sub> ）用作具有氧等离子体作为氧化剂的廉价金属前体。薄膜生长速率与镍前体和血浆暴露饱和。在225到275°C之间观察到ALD窗口。线性生长在250℃下实现，生长速率为0.042nm。厚度高度均匀，表面粗糙度低于1nm rms，对于Si（100）上的52nm厚的薄膜。可以加工具有宽高比的基板，最高可达1:10。沉积，薄膜由多晶，立方体NIO组成，并且在整个可见范围内透明，具有3.7eV的光学带隙。薄膜由化学计量的NiO组成，含有碳杂质的≈1％。这些薄膜的两个有希望的应用在可再生能源转换和储存装置中展示：薄膜是无针孔的，并且具有出色的电子阻挡能力，使得它们在太阳能电池中的潜在孔选择性接触层。此外，对碱性氧气进化反应进行了对超薄NiO膜的高电催化活性，尤其是含有Fe的电解质 3 + </ sup> 。 </ p> </摘要> </span> <span class="z_kbtn z_kbtnclass hoverxs" style="display: none;">展开▼</span> </div> </div> <div class="record"> <h2 class="all_title" id="enpatent33" >著录项</h2> <ul> <li> <span class="lefttit">来源</span> <div style="width: 86%;vertical-align: text-top;display: inline-block;"> <a href='/journal-foreign-18063/'>《Advanced materials interfaces》</a> <b style="margin: 0 2px;">|</b><span>2018年第16期</span><b style="margin: 0 2px;">|</b><span>共12页</span> </div> </li> <li> <div class="author"> <span class="lefttit">作者</span> <p id="fAuthorthree" class="threelineshidden zhankaihshouqi"> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Hufnagel Alexander G.&option=202" target="_blank" rel="nofollow">Hufnagel Alexander G.;</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Hen? Ann‐Kathrin&option=202" target="_blank" rel="nofollow">Hen? Ann‐Kathrin;</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Hoffmann Ramona&option=202" target="_blank" rel="nofollow">Hoffmann Ramona;</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Zeman Otto E. O.&option=202" target="_blank" rel="nofollow">Zeman Otto E. O.;</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=H?ringer Sebastian&option=202" target="_blank" rel="nofollow">H?ringer Sebastian;</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Fattakhova‐Rohlfing Dina&option=202" target="_blank" rel="nofollow">Fattakhova‐Rohlfing Dina;</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Bein Thomas&option=202" target="_blank" rel="nofollow">Bein Thomas;</a> </p> <span class="z_kbtnclass z_kbtnclassall hoverxs" id="zkzz" style="display: none;">展开▼</span> </div> </li> <li> <div style="display: flex;"> <span class="lefttit">作者单位</span> <div style="position: relative;margin-left: 3px;max-width: 639px;"> <div class="threelineshidden zhankaihshouqi" id="fOrgthree"> <p>Department of Chemistry and Center for NanoScience (CeNS)Ludwig‐Maximilians‐Universit?t München (LMU)Butenandtstr. 5–13 (E) 81377 Munich Germany;</p> <p>Department of Chemistry and Center for NanoScience (CeNS)Ludwig‐Maximilians‐Universit?t München (LMU)Butenandtstr. 5–13 (E) 81377 Munich Germany;</p> <p>Department of Chemistry and Center for NanoScience (CeNS)Ludwig‐Maximilians‐Universit?t München (LMU)Butenandtstr. 5–13 (E) 81377 Munich Germany;</p> <p>Department of Chemistry and Center for NanoScience (CeNS)Ludwig‐Maximilians‐Universit?t München (LMU)Butenandtstr. 5–13 (E) 81377 Munich Germany;</p> <p>Department of Chemistry and Center for NanoScience (CeNS)Ludwig‐Maximilians‐Universit?t München (LMU)Butenandtstr. 5–13 (E) 81377 Munich Germany;</p> <p>Forschungszentrum Jülich GmbHInstitute of Energy and Climate Research (IEK‐1)Wilhelm‐Johnen‐Stra?e 52425 Juelich Germany;</p> <p>Department of Chemistry and Center for NanoScience (CeNS)Ludwig‐Maximilians‐Universit?t München (LMU)Butenandtstr. 5–13 (E) 81377 Munich Germany;</p> </div> <span class="z_kbtnclass z_kbtnclassall hoverxs" id="zhdw" style="display: none;">展开▼</span> </div> </div> </li> <li > <span class="lefttit">收录信息</span> <span style="width: 86%;vertical-align: text-top;display: inline-block;"></span> </li> <li> <span class="lefttit">原文格式</span> <span>PDF</span> </li> <li> <span class="lefttit">正文语种</span> <span>eng</span> </li> <li> <span class="lefttit">中图分类</span> <span><a href="https://www.zhangqiaokeyan.com/clc/6960.html" title="特种结构材料">特种结构材料;</a></span> </li> <li class="antistop"> <span class="lefttit">关键词</span> <p style="width: 86%;vertical-align: text-top;"> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=blocking layers&option=203" rel="nofollow">blocking layers;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=electrocatalysis&option=203" rel="nofollow">electrocatalysis;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=nickel oxide&option=203" rel="nofollow">nickel oxide;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=plasma‐enhanced atomic layer deposition&option=203" rel="nofollow">plasma‐enhanced atomic layer deposition;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=thin films&option=203" rel="nofollow">thin films;</a> </p> <div class="translation"> 机译：阻塞层;电殖分析;氧化镍;等离子体增强的原子层沉积;薄膜; </div> </li> </ul> </div> </div> <div class="literature cardcommon"> <div class="similarity "> <h3 class="all_title" id="enpatent66">相似文献</h3> <div class="similaritytab clearfix"> <ul> <li class="active" >外文文献</li> <li >中文文献</li> <li >专利</li> </ul> </div> <div class="similarity_details"> <ul > <li> <div> <b>1. </b><a class="enjiyixqcontent" href="/journal-foreign-detail/0704022433832.html">Nickel Oxide: Electron‐Blocking and Oxygen Evolution Catalyst Layers by Plasma‐Enhanced Atomic Layer Deposition of Nickel Oxide (Adv. 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href="/academic-journal-cn_chinese-journal-catalysis_thesis/0201280713652.html">溶解-再生长法构建Fe-Dy氧化物调控镍-有机框架电子结构的高性能水分解电催化剂</a> <b>[J]</b> <span> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=万梓霞&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor"> . 万梓霞</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=何秋婷&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor">,何秋婷</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=陈菊丹&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor">,陈菊丹</a> <span> <a href="/journal-cn-28399/" target="_blank" rel="nofollow" class="tuijian_authcolor"> . 催化学报 </a> </span> <span> . 2020</span><span>,第011期</span> </span> </div> </li> <li> <div> <b>6. </b><a class="enjiyixqcontent" href="/academic-conference-cn_meeting-3500_thesis/02022808890.html">热原子层沉积与等离子体辅助原子层沉积氧化铝薄膜的比较</a> <b>[C]</b> <span> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Yuanxin Zhao&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor"> . Yuanxin Zhao</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=赵元鑫&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor">,赵元鑫</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Lijun Sang&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor">,Lijun Sang</a> <span> <a href="/conference-cn-3500/" target="_blank" rel="nofollow" class="tuijian_authcolor"> . 2014全国（宁波）防锈润滑包装学术研讨会 </a> <span> <span> . 2014</span> </span> </div> </li> <li> <div> <b>7. </b><a class="enjiyixqcontent" href="/academic-degree-domestic_mphd_thesis/020313245087.html">等离子体增强原子层沉积低温生长InN薄膜</a> <b>[A] </b> <span> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=杨祺&option=202" target="_blank" rel="nofollow" class="tuijian_auth tuijian_authcolor"> . 杨祺</a> <span> . 2017</span> </span> </div> </li> </ul> <ul style="display: none;"> <li> <div> <b>1. </b><a class="enjiyixqcontent" href="/patent-detail/06120110473875.html">一种等离子体增强原子层沉积碳化镍薄膜的设备及方法</a> <b>[P]</b> . <span> 中国专利： CN108004522A </span> <span> . 2018-05-08</span> </div> </li> <li> <div> <b>2. </b><a class="enjiyixqcontent" href="/patent-detail/06120111845211.html">用于空间等离子体增强原子层沉积（PE-ALD）处理工具的微波等离子体源</a> <b>[P]</b> . <span> 中国专利： CN111819657A </span> <span> . 2020-10-23</span> </div> </li> <li> <div> <b>3. </b><a class="enjiyixqcontent" href="/patent-detail/06130429245863.html">Organic opto-electronic component i.e. organic LED, manufacturing method, involves applying barrier layers on organic functional layer by plasma enhanced atomic layer deposition and by plasma-enhanced chemical vapor deposition</a> <b>[P]</b> . <span> 外国专利：  DE102008019900A1 </span> <span> . 2009-08-06</span> </div> <p class="zwjiyix translation" style="max-width: initial;height: auto;word-break: break-all;white-space: initial;text-overflow: initial;overflow: initial;"> <span>机译：有机光电组件，即有机LED，制造方法，涉及通过等离子体增强的原子层沉积和等离子体增强的化学气相沉积在有机功能层上施加阻挡层。 </span> </p> </li> <li> <div> <b>4. </b><a class="enjiyixqcontent" href="/patent-detail/06130426813853.html">Barrier layer-encapsulated electronic component, e.g. LED, is obtained by successively applying layers by plasma-less atomic layer deposition and plasma-enhanced chemical vapor deposition</a> <b>[P]</b> . <span> 外国专利：  DE102008031405A1 </span> <span> . 2010-01-07</span> </div> <p class="zwjiyix translation" style="max-width: initial;height: auto;word-break: break-all;white-space: initial;text-overflow: initial;overflow: initial;"> <span>机译：阻挡层封装的电子元件，例如LED是通过无等离子体原子层沉积和等离子体增强化学气相沉积依次施加各层而获得的 </span> </p> </li> <li> <div> <b>5. </b><a class="enjiyixqcontent" href="/patent-detail/06130426803047.html">Barrier layer-encapsulated electronic component, e.g. LED, is obtained by successively applying layers by plasma-less atomic layer deposition and plasma-enhanced chemical vapor deposition</a> <b>[P]</b> . <span> 外国专利：  DE102008048472A1 </span> <span> . 2010-03-25</span> </div> <p class="zwjiyix translation" style="max-width: initial;height: auto;word-break: break-all;white-space: initial;text-overflow: initial;overflow: initial;"> <span>机译：阻挡层封装的电子元件，例如LED是通过无等离子体原子层沉积和等离子体增强化学气相沉积依次施加各层而获得的 </span> </p> </li> </ul> </div> </div> </div> <div class="theme cardcommon" style="overflow: auto;display:none"> <h3 class="all_title" id="enpatent55">相关主题</h3> <ul id="subject"> </ul> </div> </div> </div> </div> <div class="right rightcon"> <div class="details_img cardcommon clearfix" style="margin-bottom: 10px;display:none;" > </div> </div> </div> <div id="thesis_get_original1" class="downloadBth" style="bottom: 19px;z-index: 999;" onclick="ywcd('0704022435850','4',7,2,1,'',this,24)" class="delivery" prompt="010401" title="通过人工服务将文献原文发送至邮箱" >获取原文</div> <div class="journalsub-pop-up" style="display: none"> <div class="journal-sub"> <h2>期刊订阅</h2> <img src="https://cdn.zhangqiaokeyan.com/img/loginclose.png" 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