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Ge-on-GaAs film resistance thermometers: Low-temperature conduction and magnetoresistance

机译:Ge-on-GaAs薄膜电阻温度计:低温传导和磁阻

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摘要

We investigated and generalized the resistance temperature and magnetic field dependences for various versions of cryogenic resistance thermometers based on Ge films on semi-insulating GaAs substrates. It is shown that, at low temperatures, the conductivity mechanism that is responsible for Ge film heat and magnetic field sensitivity is variable-range hopping (VRH). We found that the exponent x in VRH-type temperature law may take different values (fall between 0.25 and 0.67) for different versions of Ge-on-GaAs film thermometers. The magnetoresistance of Ge films depends strongly on the nature of hopping conductivity. It may be positive and negative as well as high and low. We found that, in the 1.8-4.2 K temperature range studied, the Ge films with x s 0.25 (that corresponds to nonzero constant density of states at the Fermi level) demonstrate high positive magnetoresistance. The films with x > 0.4 (that corresponds to presence of a gap in the density of states at the Fermi level) have negative magnetoresistance component that predominates at magnetic induction up to 3-5 T. The parameters describing VRH conductivity in the Ge-on-GaAs films thermometers were determined. From practical point of view for thermometry, the possibility to describe the R =f(T) dependence by an analytical equation (VRH-type temperature law) does not require the fitting procedure and makes calibration and thermometry more simple and convenient.
机译:我们研究并概括了基于半绝缘GaAs衬底上的Ge膜的各种版本的低温电阻温度计的电阻温度和磁场依赖性。结果表明,在低温下,负责锗薄膜热和磁场敏感性的电导率机制是可变范围跳变(VRH)。我们发现,对于不同版本的Ge-on-GaAs薄膜温度计,VRH型温度定律中的指数x可能取不同的值(介于0.25和0.67之间)。 Ge膜的磁阻在很大程度上取决于跳跃电导的性质。它可以是正负,也可以是高低。我们发现,在研究的1.8-4.2 K温度范围内,x s 0.25(对应于费米能级的非零常数密度的状态)的Ge膜表现出较高的正磁阻。 x> 0.4(对应于在费米能级的状态密度中存在间隙的薄膜)具有负磁阻分量,该分量在磁感应强度高达3-5 T时占主导地位。描述Ge-on上VRH电导率的参数测定了GaAs膜温度计。从测温的实际角度来看,用解析方程(VRH型温度定律)描述R = f(T)依赖性的可能性不需要拟合过程,并且使校准和测温更加简单和方便。

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