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Ramp rate dependence of E-I characteristics in Bi2223/Ag HTS tapes

机译:Bi2223 / Ag HTS胶带中E-I特性的斜率依赖性

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We have been studying the ramp rate dependence of the E-I characteristics under self-magnetic field in Bi2223/Ag HTS tapes at 77 K. In this paper, we have examined an experimental result and a numerical analysis. Experimentally, we applied about 70 A, which is about twice that of the I_c into Bi2223/Ag HTS tapes at ramp rates of 14 kA/s to 1.4 MA/s. When the ramp rate increases, the electric field of the E-I characteristics increases. The experimental results were compared to that of numerical analysis using finite element method. As a result, when the ramp rate increases, the transport current concentrates to the outer filaments. Therefore, the skin effect occurs for the higher ramp rate, and eddy current loss in Ag sheath increases.
机译:我们已经研究了Bi2223 / Ag HTS磁带在77 K的自磁场下E-I特性的斜率依赖性。在本文中,我们研究了实验结果和数值分析。在实验中,我们以14 kA / s至1.4 MA / s的斜率将大约70 A的电流施加到Bi2223 / Ag HTS磁带中,是I_c的两倍。当斜率增加时,E-I特性的电场增加。将实验结果与使用有限元法进行数值分析的结果进行了比较。结果,当斜率增加时,传输电流集中到外部细丝。因此,趋于较高的斜率发生趋肤效应,并且Ag鞘中的涡流损耗增加。

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