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Enhance the fluorination activity of graphene via the interfacial interaction from Ni(111) substrate

机译:通过Ni(111)衬底的界面相互作用增强石墨烯的氟化活性

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摘要

The functionalization of graphene will render it with novel properties through modifying its chemical, structural and electronic properties, and therefore it has been intensively investigated. As one effective method to enhance the surface activity of graphene, fluorination of graphene with chemical controllability and topographical uniformity is highly desirable yet grandly challenging. In this study, the density functional theory calculations have been carried out to investigate the fluorination activity of graphene on Ni(1 1 1) and graphite. The results indicate that the interfacial interaction between graphene and Ni(1 1 1) can remarkably enhance the binding energies of F atoms on graphene via the intensive charge transfer between C atoms and Ni atoms. The atomic stacking of graphene and top layer of Ni(1 1 1) has a remarkable influence on the binding energies of F atoms, and the C atoms at the hollow sites of Ni(1 1 1) are more likely to be fluorinated. In addition, due to the confinement from Ni(1 1 1), the crystalline structure and corrugation of graphene are well preserved after the fluorination. As for the case of graphene on graphite, its fluorination activity is similar to monolayer graphene. Moreover, the fluorination activity of graphene on Ni(1 1 1) was found to be layer-dependent, namely being reduced as a result of the attenuation of the interfacial interaction from Ni(1 1 1) with the increasing of graphene layers. (C) 2018 Elsevier B.V. All rights reserved.
机译:石墨烯的官能化通过改变其化学,结构和电子特性,使其具有新颖性质,因此它被密集地研究。作为增强石墨烯表面活性的一种有效方法,具有化学可控性和地形均匀性的石墨烯的氟化是非常理想的但是巨大的挑战性。在该研究中,已经进行了密度函数理论计算,以研究石墨烯对Ni(111 1)和石墨的氟化活性。结果表明,石墨烯和Ni(111)之间的界面相互作用通过C原子和Ni原子之间的强烈电荷转移,可以显着地增强石墨烯上的F原子的结合能。石墨烯和顶层Ni(111)的原子堆叠对F原子的结合能具有显着影响,并且Ni(1111)的中空部位的C原子更可能是氟化的。另外,由于Ni(111)的禁闭,氟化后,石墨烯的结晶结构和波纹良好地保存。如石墨上石墨烯的情况,其氟化活性类似于单层石墨烯。此外,发现石墨烯对Ni(111)的氟化活性依赖于层依赖性,即由于从Ni(111)的界面相互作用随着石墨烯层的增加而减小。 (c)2018 Elsevier B.v.保留所有权利。

著录项

  • 来源
    《Computational Materials Science 》 |2018年第2018期| 共6页
  • 作者单位

    Univ Sci &

    Technol Beijing Key Lab Environm Fracture MOE Corros &

    Protect Ctr Beijing 100083 Peoples R China;

    Tsinghua Univ State Key Lab Tribol Beijing 100084 Peoples R China;

    Univ Sci &

    Technol Beijing Key Lab Environm Fracture MOE Corros &

    Protect Ctr Beijing 100083 Peoples R China;

    Tsinghua Univ State Key Lab Tribol Beijing 100084 Peoples R China;

    Tsinghua Univ State Key Lab Tribol Beijing 100084 Peoples R China;

    Tsinghua Univ State Key Lab Tribol Beijing 100084 Peoples R China;

    Tsinghua Univ State Key Lab Tribol Beijing 100084 Peoples R China;

    Univ Sci &

    Technol Beijing Key Lab Environm Fracture MOE Corros &

    Protect Ctr Beijing 100083 Peoples R China;

    Univ Sci &

    Technol Beijing Key Lab Environm Fracture MOE Corros &

    Protect Ctr Beijing 100083 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学 ;
  • 关键词

    Graphene; Fluorination; Interfacial interaction; DFT calculations;

    机译:石墨烯;氟化;界面相互作用;DFT计算;

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