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First-principles calculations of the structural, elastic, electronic and optical properties of Si2P2O and Ge2P2O at high pressures

机译:高压下Si2P2O和GE2P2O结构,弹性,电子和光学性能的第一原理计算

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摘要

The structures of Si2P2O and Ge2P2O with the space group Cmc21 are derived. The structural, mechanical, elastic anisotropy, electronic and optoelectronic properties are calculated by first principles calculations based on density functional theory (DFT) with generalized gradient approximation (GGA) at high pressure for Si2P2O and Ge2P2O. By using the elastic stability criteria, it is shown that their structures are all stable. The phonon dispersion spectra are researched throughout the Brillouin zone as implemented in the CASTEP code, which indicates that the optimized structures are stable dynamically. The brittle/ductile behaviors are assessed in the pressures from 0 GPa to 50 GPa. Our calculations present that the performances of them become ductile with pressure rise. Moreover, the anisotropies of them are discussed by the Young's moduli at different pressure, and the results indicate that the anisotropies of them are obvious. The direct band structures of Ge2P2O and the indirect band gap of Si2P2O show that Si2P2O and Ge2P2O present semiconducting character at 0 GPa and 50 GPa. The band structures of Si2P2O are changed obviously with the increase of pressure. The total DOS originate mainly from O 's' states, O 'p' states, P 's' statesand P 'p' states and M 'p' states (M = Si, Ge). The trends of DOS for Si2P2O and Ge2P2O display many similarities, and the change of DOS is obviously affected by the pressure for Si2P2O. The optoelectronic properties of them are researched. The calculated static dielectric constants, epsilon(1)(0), are 3.2 at 0 GPa and 6.4 at 50 GPa for Si2P2O, and the values of Ge2P2O are 10.2 and 9.2 at 0 GPa and 50 GPa.
机译:衍生Si2P2O和GE2P2O与空间组CMC21的结构。结构,机械,弹性各向异性,电子和光电性能通过基于密度泛函理论(DFT)的第一原理计算,在Si2P2O和GE2P2O的高压下具有广义梯度近似(GGA)。通过使用弹性稳定性标准,示出了它们的结构均稳定。在Castep代码中实现的整个布里渊区研究了声音色散谱,这表明优化的结构是动态稳定的。在0GPA至50GPa的压力中评估脆性/延性行为。我们的计算表明,它们的性能变得具有压力升高的延性。此外,杨氏模数在不同的压力下讨论了它们的各向同性,结果表明它们的各向异性是显而易见的。 GE2P2O的直接带结构和Si2P2O的间接带隙显示Si2P2O和GE2P2O在0GPa和50GPa处存在半导体特征。随着压力的增加,Si2P2O的带结构明显改变。总DOS主要来自O'SENGS,O'P'状态,P'S的“Solysand P'P'状态和M'P'状态(M = SI,GE)。对于Si2P2O和GE2P2O的DOS趋势显示了许多相似之处,并且DOS的变化显然受到SI2P2O的压力的影响。研究了它们的光电性质。计算出的静电介电常数,ε(1)(0),在0GPa和6.4处为3.2,在50gPa下为Si2P2O,并且Ge2p2O的值为10.2和9.2,在0 gpa和50gPa。

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