首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Recovery of surface state bands after desorption of Te capping layer on (Bi1-xSbx)(2)Te-3 ternary topological insulators
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Recovery of surface state bands after desorption of Te capping layer on (Bi1-xSbx)(2)Te-3 ternary topological insulators

机译:在TE覆盖层的解吸后恢复(BI1-XSBX)(2)TE-3三元拓扑绝缘体的解吸后的表面状态带

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摘要

Te capping layer on topological insulator (TI) surface provides an efficient way for the protection of surface from oxidation. However, when using Te to protect the surface of (Bi1-xSbx)(2)Te-3 ternary topological insulators, it is still unclear for the influence of Te on the surface chemical composition and the surface state bands after the procedure of capping and desorption of Te. Here, we have performed a systematic study of the surface morphology, crystallinity, chemical composition as well as the band structure of (Bi1-xSbx)(2)Te-3 after the desorption of the Te capping layer. Our results confirm a good recovery of the surface state bands of the (B1-xSbx)(2)Te-3 ternary topological insulators with different Bi and Sb compositions. The chemical composition of (Bi1-xSbx)(2)Te-3 remains almost unchanged after the desorption of Te. This study proves that the Te capping layer works as a suitable protection for ternary (Bi1-xSbx)(2)Te-3 TI layers, allowing for ex situ transfer of TI samples in air. This opens the way for the development of metal/TI hybrid structures for advanced spintronic applications.
机译:上拓扑绝缘体(TI)表面TE盖层提供了一种用于表面的氧化保护的有效方式。然而,使用碲保护的(BI1-xSbx)表面时,(2)Te类3三元拓扑绝缘体,目前还不清楚将Te的上表面化学组成封盖和手术后的影响,表面状态带特解吸。这里,我们已经进行了表面形态,结晶度,碲-3 Te组成的解吸后的化学组成,以及作为(BI1-xSbx)的带结构(2)覆盖层的系统研究。我们的结果证实了(B1-xSbx)的表面状态的频带的恢复良好(2)Te类3三元拓扑绝缘体具有不同的Bi和Sb的组合物。的化学组成(BI1-xSbx)(2)Te类3保持Te组成的解吸后几乎没有变化。本研究证明,碲覆盖层可以作为三元(BI1-xSbx)(2)一个合适的保护Te类3 TI层,允许在空气中TI样品易地传输。这就为金属/ TI混合结构的发展,为先进的自旋电子应用程序的方式。

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  • 作者单位

    Univ Lorraine CNRS Inst Jean Lamour UMR 7198 Campus ARTEM 2 Allee Andre Guinier F-54011 Nancy France;

    Tsinghua Univ Dept Phys State Key Lab Low Dimens Quantum Phys Beijing 100084 Peoples R China;

    Univ Lorraine CNRS Inst Jean Lamour UMR 7198 Campus ARTEM 2 Allee Andre Guinier F-54011 Nancy France;

    Univ Lorraine CNRS Inst Jean Lamour UMR 7198 Campus ARTEM 2 Allee Andre Guinier F-54011 Nancy France;

    Univ Lorraine CNRS Inst Jean Lamour UMR 7198 Campus ARTEM 2 Allee Andre Guinier F-54011 Nancy France;

    Univ Lorraine CNRS Inst Jean Lamour UMR 7198 Campus ARTEM 2 Allee Andre Guinier F-54011 Nancy France;

    Univ Lorraine CNRS Inst Jean Lamour UMR 7198 Campus ARTEM 2 Allee Andre Guinier F-54011 Nancy France;

    Univ Lorraine CNRS Inst Jean Lamour UMR 7198 Campus ARTEM 2 Allee Andre Guinier F-54011 Nancy France;

    Univ Lorraine CNRS Inst Jean Lamour UMR 7198 Campus ARTEM 2 Allee Andre Guinier F-54011 Nancy France;

    Tsinghua Univ Dept Phys State Key Lab Low Dimens Quantum Phys Beijing 100084 Peoples R China;

    Tsinghua Univ Dept Phys State Key Lab Low Dimens Quantum Phys Beijing 100084 Peoples R China;

    Univ Lorraine CNRS Inst Jean Lamour UMR 7198 Campus ARTEM 2 Allee Andre Guinier F-54011 Nancy France;

    Univ Lorraine CNRS Inst Jean Lamour UMR 7198 Campus ARTEM 2 Allee Andre Guinier F-54011 Nancy France;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;
  • 关键词

    topological insulator; surface state bands; Dirac point; angle resolved photoemission spectroscopy; capping and desorption;

    机译:拓扑绝缘体;表面状态频带;DIRAC点;角度分辨的光曝光光谱;封盖和解吸;

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