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首页> 外文期刊>Journal of Nuclear Materials: Materials Aspects of Fission and Fusion >The preparation and properties of the C-doped modified layers on uranium surfaces by pulsed laser irradiating
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The preparation and properties of the C-doped modified layers on uranium surfaces by pulsed laser irradiating

机译:脉冲激光照射铀表面C掺杂改性层的制备与性质

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摘要

The C-doped modified layer on uranium surface was prepared by pulsed laser irradiating in methane atmosphere. The microstructure of the obtained layer was characterised by X-ray diffraction (XRD), Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). The results show that the obtained layer is a composite layer with a gradual transition structure from UO2/free carbon to UO2-x/ UCxOy/free carbon to UC1-xOy/UC, and eventually to metallic U. To investigate the oxidation mechanism of the C-doped modified layer, initial oxidation behavior of O-rich surface and O-poor surface obtained after sputtering for 7 min and 60 min were studied by XPS. And the results illustrate that UCxOy with U4f(7/2) binding energy at 379.5 eV in the O-rich region is more resistant to oxidation than UC1-xOy/UC under oxygen exposure. Free carbon is distributed in the surface layer of C-doped modified layer prepared by pulsed laser irradiating, and the free carbon is also formed after oxidation of UC1-xOy, UC and UCxOy at room temperature. We speculate that the aggregation of free carbon increases the ability to prevent the inward diffusion of O atoms. Moreover, the results of the potentiodynamic polarization tests show that the C-doped modified layer improved the corrosion protective properties of metallic U. The self-corrosive potential and self-corrosive current of the C-doped modified layer are -1.47 x 10(-1) V vs. SCE and 9.46 x 10(-8) A/cm(2), respectively, while the values of metallic U are -5.67 x 10(-1) V vs. SCE and 8.08 x 10(-7) A/cm(2), respectively. (C) 2019 Elsevier B.V. All rights reserved.
机译:通过在甲烷气氛中照射脉冲激光制备铀表面上的C掺杂的改性层。通过X射线衍射(XRD),螺旋电子光谱(AES)和X射线光电子谱(XPS)的X射线衍射(X射线)的微观结构表征。结果表明,所获得的层是一种复合层,其具有来自UO 2 /游离碳的逐渐过渡结构至UC1-XOY / UC,最终对UO2-X / Ucxoy / Free碳,并最终探讨氧化机制通过XPS研究了富溅射7分钟后获得的富含O的改性层,富含O的表面和O差的表面的初始氧化行为和60分钟。结果表明,在富含O-富荷的区域379.5eV的U4F(7/2)结合能量的UCxoy比UC1-XOY / UC在氧暴露下比UC1-XOY / UC更耐氧化。游离碳分布在通过脉冲激光照射制备C-掺杂改性层的表面层中,并在室温下UC1-XOY,UC和UCxOy的氧化后也形成游离碳。我们推测,游离碳的聚集增加了防止O原子向内扩散的能力。此外,电位动力学偏振试验的结果表明,C掺杂的修饰层改善了金属U的腐蚀保护性。C掺杂改性层的自腐蚀电位和自腐蚀电流为-1.47×10( - 1)V与SCE和9.46 x 10(-8)A / cm(2),而金属U的值为-5.67 x 10(-1)V与SCE和8.08 x 10(-7)分别为A / cm(2)。 (c)2019 Elsevier B.v.保留所有权利。

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