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首页> 外文期刊>Journal of Molecular Structure >Fabrication of Eu doped CdO [Al/Eu-nCdO/p-Si/Al] photodiodes by perfume atomizer based spray technique for opto-electronic applications
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Fabrication of Eu doped CdO [Al/Eu-nCdO/p-Si/Al] photodiodes by perfume atomizer based spray technique for opto-electronic applications

机译:欧盟掺杂CDO [Al / Eu-NCDO / P-Si / al]光电二极管通过香水雾化器的喷涂技术进行光电应用

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In this study, thin films of cadmium oxide (CdO) with different concentrations (0, 1, 3, and 5 wt%) of Eu doping were deposited onto Si and glass substrates by a novel and facile spray technique using simple perfume atomizer for the first time. Prepared films were characterized for structural, morphological, optical properties and the photo diode studies, using X-ray diffraction, scanning electron microscope, UV-Vis spectrophotometer, I-V characteristics, and fundamental parameters are reported. All the prepared Eu:CdO films exhibit cubic structure. The preferential orientation is along (200) plane. Scanning electron microscopy study indicates the growth of smooth and pin-hole free films with clusters of homogeneous grains. The values of band gap energy are found to be varying from 2.42 to 2.33 eV for various Eu doping concentration from 0 to 5 wt%. EDAX studies revealed the presence of Eu, Cd and O elements without any other impurities. FTIR spectra showed a peak at 575 cm(-1) confirming the stretching mode of Cd-O. The resistivity (rho), high carrier concentration (n) and carrier mobility (mu) for 3 wt% CdO thin film are found to be 0.452 x 10(-3)(Omega.cm), 17.82 x 10(20) cm(-3) and 7.757 cm(2)/V, respectively. Current-voltage measurements on the fabricated nanostructured Al/Eu-nCdO/p-Si/Al heterojunction device showed a non-linear electric characteristics indicating diode like behaviour. (C) 2018 Elsevier B.V. All rights reserved.
机译:在该研究中,通过使用简单的香水雾化器的新颖和容易的喷涂技术将具有不同浓度(0,1,3和5wt%)的欧盟掺杂的氧化镉(CDO)的薄膜沉积在Si和玻璃基板上第一次。报道了制备的薄膜的表征,使用X射线衍射,扫描电子显微镜,UV-VIS分光光度计,I-V特性和基本参数,表征了结构,形态学,光学性质和光学二极管研究。所有制备的欧盟:CDO薄膜表现出立方结构。优先定向沿着(200)平面。扫描电子显微镜研究表明光滑孔免疫膜的生长,其具有均匀晶粒的簇。对于各种EU掺杂浓度为0至5wt%,发现带隙能量的值从2.42到2.33eV变化。 edax研究显示出欧盟,Cd和O元素的存在,没有任何其他杂质。 FTIR光谱显示在575cm(-1)处的峰值,确认CD-O的拉伸模式。 3wt%CDO薄膜的电阻率(RHO),高载流量(n)和载体迁移率(mU)为0.452×10(-3)(ωcm),17.82×10(20)cm( -3)和7.757厘米(2)/ v。制造的纳米结构AL / EU-NCDO / P-Si / Al异质结装置上的电流 - 电压测量显示出指示二极管的非线性电特性。 (c)2018年elestvier b.v.保留所有权利。

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