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首页> 外文期刊>Journal of nanoscience and nanotechnology >Preparation, Characterization and Surface Free Energy of Nickel-Doped Silica Organic-Inorganic Hybrid Membrane for H-2/CO2 Separation
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Preparation, Characterization and Surface Free Energy of Nickel-Doped Silica Organic-Inorganic Hybrid Membrane for H-2/CO2 Separation

机译:用于H-2 / CO2分离的镍掺杂二氧化硅有机 - 无机杂交膜的制备,表征和表面自由能

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Nickel-doped silica organic-inorganic hybrid (Ni/SiO2) membranes based on tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) were prepared via a sol-gel process for H-2/CO2 separation. The influence of calcination temperature and Ni-doping amount on the microstructure and surface free energy of Ni/SiO2 materials was investigated. The permeance of H-2 and CO2 and vapor stability of the membranes were tested. For the Ni/SiO2 membrane, the optimal calcination temperature should be 350 degrees C and Ni/TEOS molar ratio is 0.1. After calcination at 350 degrees C, nickel element exists in form of Ni-O-Si structure and crystalline NiO with small grain size. At this temperature, the water contact angle of Ni/SiO2 film achieved a maximum of (96.1 +/- 0.4)degrees and the surface free energy reached the minimum. The H-2 and CO2 permeance of freshly-prepared the Ni/SiO2 membrane was 7.86 x 10(-6) and 1.50 x 10(-6) mol m(-2) Pa-1 s(-1), respectively, at 25 degrees C and a pressure difference of 0.4 MPa. Compared with the pure SiO2 membrane, the H-2 permeance and H-2/CO2 selectivity of Ni/SiO2 membrane increased by 20.9% and 15.9%, respectively. After aging in the moist condition for 7 d, the H-2 permeance of Ni/SiO2 membrane was reduced by 6.9% and the H-2/CO2 selectivity increased by 4.7%. The Ni/SiO2 membrane showed higher H-2 permeance, H-2/CO2 selectivity and vapor stability than pure SiO2 membrane .
机译:基于四乙基氨基硅酸盐(TEOS)和甲基三乙氧基硅烷(MTES)的镍掺杂二氧化硅有机 - 无机杂交(Ni / SiO 2)膜通过溶胶 - 凝胶法制备H-2 / CO 2分离。研究了煅烧温度和Ni-掺杂量对Ni / SiO2材料的微观结构和表面自由能的影响。测试了H-2和CO 2的渗透率和膜的蒸汽稳定性。对于Ni / SiO 2膜,最佳煅烧温度应为350℃,Ni / Teos摩尔比为0.1。在350℃下煅烧后,镍元素以Ni-O-Si结构的形式存在,具有小晶粒尺寸的结晶NiO。在该温度下,Ni / SiO 2膜的水接触角最大地实现(96.1 +/- 0.4)度,表面自由能达到最小值。新鲜制备的H-2和CO2渗透率分别为7.86×10(-6)和1.50×10(-6)摩尔M(-2)PA-1S(-1),在25℃和0.4MPa的压力差。与纯SiO2膜相比,Ni / SiO2膜的H-2渗透率和H-2 / CO 2选择性分别增加了20.9%和15.9%。在7天的潮湿条件下老化后,Ni / SiO 2膜的H-2渗透率降低了6.9%,H-2 / CO 2选择性增加了4.7%。 Ni / SiO2膜显示出高于H-2渗透率,H-2 / CO 2选择性和蒸汽稳定性而不是纯SiO 2膜。

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