Preparation and service performance characterization of Ni/PMN-PT:Effect of preparation temperature

摘要

Ni/PMN-PT thin films were prepared by DC megnetron sputtering, and different sputtering temperatures were applied. The crystalline micro-structure and morphology were characterized by XRD, EDS, VSM and SEM. The magneto-electric properties and adhesion strength were measured by force-magneto-electric measurement system and Nano Test Vantage system. The magnetic hystersis loops indicated that the thin film expressed obvious electric-field modulation effect on magnetic properties. By adjusting the sput?tering temperature, the crystalline and magnetic properties in Ni/PMN-PT thin film can be improved significantly. In addition, the scratch behavior showed that the critical load values for cracking and failure were significantly related with the sputtering temperature.