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Polymer multilayer films for high temperature capacitor application

机译:高温电容器应用的聚合物多层膜

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摘要

Advanced film capacitors require polymers with high thermal stability, high breakdown strength, and low loss for high temperature dielectric applications. To fulfill such requirements, two polymer multilayer film systems were coextruded via the forced assembly technique. High glass transition temperature (T-g) polycarbonate (HTPC, T-g=165 degrees C) and polysulfone (PSF, T-g=185 degrees C) were multilayered with a high dielectric constant polymer, poly(vinylidene fluoride) (PVDF), respectively. The PSF/PVDF system was more thermally stable than the HTPC/PVDF system because of the higher T-g for PSF. At temperatures lower than 170 degrees C, the HTPC/PVDF system exhibited comparable breakdown strength and hysteresis loss as the PSF/PVDF system. While at temperatures above 170 degrees C, the PSF/PVDF system exhibited a higher breakdown strength because of the higher T-g of PSF. The electric displacement-electric field (D-E) loop behavior of the PSF/PVDF system was studied as a function of temperature. Moreover, a melt-recrystallization process could further decrease the hysteresis loss for the PSF/PVDF system due to better edge-on crystal orientation. These results demonstrate that PSF/PVDF and HTPC/PVDF systems are applicable for high temperature film capacitors. (c) 2019 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2019, 136, 47535.
机译:先进的薄膜电容器需要具有高的热稳定性,高的击穿强度和低损失高温电介质应用的聚合物。为了满足这样的要求,两种聚合物的多层膜系统是通过强制装配技术共挤出。高玻璃化转变温度(T-G)聚碳酸酯(HTPC,T-G = 165℃)和聚砜(PSF,T-G = 185℃)用高介电常数的聚合物,聚(偏二氟乙烯)(PVDF)分别多层。的PSF / PVDF系统是更加热稳定不是因为较高的T g下PSF的HTPC / PVDF系统。在温度大于170度降低C,所述HTPC / PVDF系统表现出相当的击穿强度和磁滞损耗作为PSF / PVDF系统。而在温度高于170℃时,PSF / PVDF系统表现出由于PSF的较高的T g的较高的击穿强度。的PSF / PVDF系统的电位移 - 电场(d-E)循环行为进行了研究作为温度的函数。此外,熔融再结晶过程可进一步降低用于PSF / PVDF系统磁滞损耗由于更好的边缘上的晶体取向。这些结果表明,PSF / PVDF和HTPC / PVDF系统适用于高温薄膜电容器。 (c)2019 Wiley期刊,Inc.J.Phill。聚合物。 SCI。 2019年,136,47535。

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  • 来源
    《Journal of Applied Polymer Science 》 |2019年第20期| 共8页
  • 作者单位

    Case Western Reserve Univ Ctr Layered Polymer Syst Dept Macromol Sci &

    Engn 2100 Adelbert Rd Cleveland OH 44106 USA;

    Case Western Reserve Univ Ctr Layered Polymer Syst Dept Macromol Sci &

    Engn 2100 Adelbert Rd Cleveland OH 44106 USA;

    Case Western Reserve Univ Ctr Layered Polymer Syst Dept Macromol Sci &

    Engn 2100 Adelbert Rd Cleveland OH 44106 USA;

    Case Western Reserve Univ Ctr Layered Polymer Syst Dept Macromol Sci &

    Engn 2100 Adelbert Rd Cleveland OH 44106 USA;

    Case Western Reserve Univ Ctr Layered Polymer Syst Dept Macromol Sci &

    Engn 2100 Adelbert Rd Cleveland OH 44106 USA;

    Case Western Reserve Univ Ctr Layered Polymer Syst Dept Macromol Sci &

    Engn 2100 Adelbert Rd Cleveland OH 44106 USA;

    Case Western Reserve Univ Ctr Layered Polymer Syst Dept Macromol Sci &

    Engn 2100 Adelbert Rd Cleveland OH 44106 USA;

    Case Western Reserve Univ Ctr Layered Polymer Syst Dept Macromol Sci &

    Engn 2100 Adelbert Rd Cleveland OH 44106 USA;

    Case Western Reserve Univ Ctr Layered Polymer Syst Dept Macromol Sci &

    Engn 2100 Adelbert Rd Cleveland OH 44106 USA;

    Case Western Reserve Univ Ctr Layered Polymer Syst Dept Macromol Sci &

    Engn 2100 Adelbert Rd Cleveland OH 44106 USA;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 高分子化合物工业(高聚物工业) ;
  • 关键词

    dielectric properties; films; nanostructured polymers;

    机译:介电性能;薄膜;纳米结构聚合物;

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