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Trap distribution and mechanism for near infrared long-afterglow material AlMgGaO4:Cr3+

机译:近红外长余辉材料的陷阱分布和机制Almggao4:Cr3 +

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摘要

Near infrared (NIR) long-afterglow materials have attracted much attention due to their high penetration and low destruction in biological tissues. Here, a series of deep red and near infrared materials, AlMgGaO4:xCr(3+), were successfully synthesized by a high temperature solid state method. AlMgGaO4 was selected as the host considering its rich antisite defects, which can effectively capture electrons. The emission spectra of AlMgGaO4:xCr(3+) range from 680 nm to 1100 nm, which can be nicely decomposed into four Gaussian bands with peaks centered at 706 nm, 723 nm, 916 nm, and 938 nm, respectively. At low temperature (10 K), the emission spectra show there are four emission peaks: a sharp line (peak 1) and broad emission band (peak 2) come from Cr3+ substituting for the regular octahedron [AlO6], and two broad emission bands (peaks 3 and 4) which originate from the spin-allowed transition T-4(2)(F-4) (4)A(2)(F-4) of Cr3+ in the disordered [GaO6] and [MgO6] octahedra, respectively. Remarkably, after removing the excitation source, it exhibited more than 10 hours of afterglow emission which decreased sharply in the first 30 min and then decreased slowly. With an increase in the Cr3+ concentration, the trap depth became shallower due to the generation of the electronic trap centers . The distribution of trap centers and the mechanism of the persistent luminescence have been carefully analyzed and are also discussed.
机译:近红外线(NIR)长余辉材料由于其在生物组织的高渗透和低破坏而引起了很多关注。这里,通过高温固态方法成功地合成了一系列深红色和近红外线材料,Almggao4:XCR(3+)。考虑其富抗体缺陷的主体选择Almggao4,可以有效地捕获电子。 Almggao4:XCR(3+)的发射光谱范围为680nm至1100nm,其可以很好地分解成分别以706nm,723nm,916nm和938nm为中心的峰的四个高斯带分别。在低温(10k)时,发射光谱显示有四个发射峰:尖锐的线(峰值1)和宽发射带(峰值2)来自CR3 +代替正规八面体[ALO6],以及两个广泛的发射带。 (峰值3和4)源自旋转允许的转变T-4(2)(F-4)(4)A(2)(F-4)在无序的[GAO6]和[MgO6]八面体中的CR3 + , 分别。值得注意的是,在除去激发源后,它显示出超过10小时余辉的发射,其在第30分钟,急剧下降,然后缓慢下降的。随着CR3 +浓度的增加,由于电子陷阱中心的产生,陷阱深度变得浅。已经仔细分析了陷阱中心的分布和持续发光的机制,并进行了讨论。

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    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

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  • 正文语种 eng
  • 中图分类 化学;无机化学;
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