Direct calorimetric measurements in a PBII and deposition (PBII&D) experiment with a HiPIMS plasma source

摘要

We report on direct calorimetric probe measurements in a plasma based ion implantation and deposition (PBII&D) system, using HiPIMS as plasma and deposition source. The combination of ion implantation and physical vapor deposition is a versatile system which allows successive and simultaneous coating, doping or cleaning of a substrate surface in a complex, finely adjustable system. Due to the pulsed nature of both processes, the delay between HiPIMS and PBII pulse is a crucial parameter which can be used to effectively tune the process according to the required needs. Since the delay defines at what time during the HiPIMS period the PBII pulse is applied to the substrate, it can also be utilized to obtain time resolved information about the ion density in the substrate's environment.