TiSiCN and TiAlVSiCN nanocomposite coatings deposited from Ti and Ti-6Al-4V targets

摘要

TiSiCN and TiAlVSiCN coatings were deposited by pulsed dc magnetron sputtering of a pure Ti target and a commercial grade Ti-6Al-4V target, respectively, in an Ar + N-2 + trimethylsilane (TMS) mixture. The elemental composition of the coatings was varied by increasing the TMS flow rate (f(TMS)) from 0 to 4 sccm. The main goal of the study is to explore the possibility of using low cost commercial grade Ti-6A1-4V material as a sputtering source of Ti for depositing Ti based nanostructure coatings. The microstructure of the coatings was characterized using X-ray diffraction, X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM). The mechanical properties, sliding wear and erosion resistances of the coatings were analyzed using nanoindentation, dry ball-on-disc test, and solid particle erosion, respectively. Higher deposition rates (35-59% increase) were observed for the TiAlVSiCN coatings than those for the TiSiCN coatings under similar deposition conditions. As the fps is increased, both coating systems exhibit similar structural evolution from fine columnar grain structure to nanocomposite structure, and finally to amorphous-like structure. The incorporation of a small amount of Al and V into the TiAlVSiCN coatings directly from the Ti-6Al-4V target is beneficial for improving the mechanical properties, wear resistance, and erosion resistance of the coatings. The study demonstrates that it is practical to use commercial grade Ti-6Al-4V material as a sputtering source of Ti for depositing Ti-based nanostructure coatings to achieve higher deposition rates, improved properties and lower production cost.