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Influence of post-treatment time of trivalent chromium protection coating on aluminium alloy 2024-T3 on improved corrosion resistance

机译:三价铬保护涂层后处理时间对铝合金2024-T3改善耐腐蚀性的影响

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Low corrosion protection performances of Trivalent Chromium Process (TCP) coatings with reference to Chromium Conversion Coatings (CCC) deposited on aluminium alloys can be overcome by application of posttreatment processes. This work shows the effect of post-treatment bath (containing hydrogen peroxide and lanthanum salt) on the chemical composition, structure and the corrosion performances of TCP coating deposited on AA 2024-T3 aluminium alloy. Different times of post-treatment bath were applied on the TCP coating and the samples were analyzed by Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS), X-ray Photoelectron Spectroscopy (XPS) and Glow Discharge-Optical Emission Spectrometry (GD-OES). The ToF-SIMS and GD-OES depth profiles show that the post-treatment time has no influence on the thickness of the TCP coating and on its bi-layered structure. It is composed of an outer layer, rich in zirconium and chromium oxides and an inner layer rich in aluminium oxides and oxy-fluorides. 3D ToF-SIMS images reveal an enrichment of Cr and Zr-like species over the surface of intermetallic particles with reference to alloy matrix, whereas a homogenous distribution of La is observed. The analysis of in-depth distribution shows that La is present principally in the outer part of the TCP coating. The La concentration increases with increasing post-treatment time. The effect of post-treatment time on protection was evaluated by Electrochemical Impedance Spectroscopy (EIS) and Linear Sweep Voltammetry (LSV) in a 0.001 M NaCI + 0.1 M Na2SO4 electrolyte. The increased post-treatment time enhances the cathodic inhibition against oxygen reduction. The post-treatment provides improved coating homogeneity and sealing properties.
机译:通过在铝合金上克服沉积在铝合金上的三价铬处理(TCP)涂层的低腐蚀保护性能可以通过应用渗透方法来克服。该工作表明,治疗后浴(含有过氧化氢和镧盐)对沉积在AA 2024-T3铝合金上的TCP涂层的化学成分,结构和腐蚀性能的影响。在TCP涂层上施加不同时间的后处理浴,并通过飞行时间二次离子质谱(TOF-SIMS),X射线光电子能谱(XPS)和发光放电 - 光发射光谱法( GD-OES)。 TOF-SIMS和GD-OES深度剖面表明,后处理时间对TCP涂层的厚度和其双层结构没有影响。它由外层组成,富含锆和铬氧化铬,富含氧化铝和氟化氧化物的内层。 3D TOF-SIMS图像揭示了在金属间颗粒表面上的Cr和Zr样物种的富集,参考合金基质,而是观察到La的均匀分布。深度分布的分析表明,La主要存在于TCP涂层的外部。随着治疗后时间的增加,La浓度增加。通过电化学阻抗光谱(EIS)和线性扫描伏安法(LSV)在0.001M NaCl + 0.1M Na 2 SO 4电解质中进行治疗后的治疗方法对保护的影响。增加后处理时间增强了阴极抑制对氧还原的。后处理提供改善的涂层均匀性和密封性能。

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