首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Occupied and Unoccupied Levels of Half-Fluorinated and Perfluorinated Rubrene Thin Films Probed by One- and Two-Photon Photoemission
【24h】

Occupied and Unoccupied Levels of Half-Fluorinated and Perfluorinated Rubrene Thin Films Probed by One- and Two-Photon Photoemission

机译:占用和未占用的半氟化和全氟化橡胶薄膜水平,由单光子光曝光探测

获取原文
获取原文并翻译 | 示例
       

摘要

We measured occupied and unoccupied energy levels of half-fluorinated and perfluorinated rubrenes (C42F14H14, F-14-RUB, and C42F28, PF-RUB) thin films prepared on a highly oriented pyrolytic graphite substrate by a combination of one- and two-photon photoemission spectroscopies. It is revealed that the energy levels near the Fermi level (E-F) decrease when the fluorination degree increases, where the energies o f the highest occupied molecular orbital (HOMO) and the lowest unoccupied molecular orbital (LUMO) are located at E-F - 1.83 eV and E-F + 0.9 eV for F-14-RUB and E-F - 2.51 eV and E-F + 0.6 eV for PF-RUB, respectively. The HOMO-LUMO gaps corresponding to the energy for the creation o f free photocarriers in molecular films- known as "transport gaps"- are evaluated by 2.7 eV for F-14-RUB and 3.1 eV for PF-RUB.
机译:我们通过单光子和双光子的组合测量在高度取向的热解石墨底物上制备的半氟化和全氟化杂质(C42F14H14,F-14-ROM和C42F28,PF摩擦)薄膜的占用和未占用的能量水平。 光学激发光谱。 据透露,在氟化度增加时,费米水平(EF)附近的能量水平降低,其中最高占用的分子轨道(HOMO)和最低未占用的分子轨道(LUMO)位于EF - 1.83 EV和 对于F-14摩擦和EF-2.51 EV和EF + 0.6eV的EF + 0.9eV分别用于PF-RUB。 对应于在分子薄膜中造成的of游离光燃料的能量的同性恋差距 - 已知为“运输间隙” - 对于F-14-Rum和3.1eV进行PF-Rum,评估2.7eV。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号