UV Light Effect on Cationic Photopolymerization of the SU8 Photoresist and Its Composites with Carbon Nanotubes: New Evidence Shown by Photoluminescence Studies

摘要

The effect of UV light on the cationic photopolymerization of the SU8 negative photoresist is shown by photoluminescence (PL) studies. Our results demonstrate that the cationic photopolymerization reaction of the SU8 photoresist takes place predominantly under the influence of the UVA light. Using UVA light, the influence of carbon nanotubes [of the types single-walled carbon nanotubes (SWNTs), double-walled carbon nanotubes (DWNTs), multiwalled carbon nanotubes (MWNTs), and SWNTs functionalized with carboxyl groups (SWNTs-COOH)] on the cationic photopolymerization process of the SU8 photoresist is shown by PL studies. The cationic photopolymerization of the SU8 photoresist is monitored by the variations of the two emission bands with maxima at similar to 400-429 nm and 523-556 nm. The increase in the relative intensity of the PL band at similar to 523-556 nm is dependent on (i) the carbon nanotube concentration in the SU8 photoresist matrix; (ii) the type of carbon nanotubes, i.e., SWNTs, DWNTs, and MWNTs; and (iii) the nonfunctionalized and functionalized state of SWNTs. The results reported in this work demonstrate that PL can be used as a complementary method to Raman scattering and IR spectroscopy in the investigation of the cationic photopolymerization reaction of the SU8 negative photoresist. A decrease in the wrapping angle of carbon nanotubes with the SU8 photoresist is highlighted by anisotropic PL studies.